Abstract: A monolithic microplasma source includes a dielectric substrate having an outer surface that is exposed to a time varying electric field. A gap layer is positioned on an inner surface of the dielectric substrate. A shield including a slit is positioned on the gap layer. A relief structure is formed in at least one of the gap layer and the dielectric substrate. The dimensions of the gap layer, the slit in the shield, and the relief structure are chosen so as to prevent a formation of a continuous film across the relief structure. A chamber containing a gas is positioned adjacent to the shield so that the gas is ionized to form a microplasma when an electric field is induced in the chamber by the incident time varying electric field.

Abstract: A microplasma emission spectrometer is described that includes a chamber for confining a sample volume of gas. A microplasma source that includes a resonant antenna structure generates a microplasma in the chamber from the sample volume of gas. A RF power supply provides power to the resonant antenna structure that generates the microplasma from the sample volume of gas. A spectrally sensitive detector is optically coupled to the microplasma. The entrance of the spectrally sensitive detector has dimensions and is positioned so that emissions from at least one-tenth of a total volume of the microplasma are transmitted through the entrance of the spectrally sensitive detector.

Abstract: A method and apparatus for launching microwave energy to a plasma processing chamber in which the required magnetic field is generated by a permanent magnet structure and the permanent magnet material effectively comprises one or more surfaces of the waveguide structure. The waveguide structure functions as an impedance matching device and controls the field pattern of the launched microwave field to create a uniform plasma. The waveguide launcher may comprise a rectangular waveguide, a circular waveguide, or a coaxial waveguide with permanent magnet material forming the sidewalls of the guide and a magnetization pattern which produces the required microwave electron cyclotron resonance magnetic field, a uniform field absorption pattern, and a rapid decay of the fields away from the resonance zone.

Abstract: In a plasma-producing device, an optimized magnet field for electron cyclotron resonance plasma generation is provided by a shaped pole piece. The shaped pole piece adjusts spacing between the magnet and the resonance zone, creates a convex or concave resonance zone, and decreases stray fields between the resonance zone and the workpiece. For a cylindrical permanent magnet, the pole piece includes a disk adjacent the magnet together with an annular cylindrical sidewall structure axially aligned with the magnet and extending from the base around the permanent magnet. The pole piece directs magnetic field lines into the resonance zone, moving the resonance zone further from the face of the magnet. Additional permanent magnets or magnet arrays may be utilized to control field contours on a local scale.