Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: Various embodiments are directed at methods and systems for implementing automatic fixing of a layout, implementing fuzzy pattern replacement, and implementing pattern capturing in a layout of an electronic circuit design. Various processes or modules comprise the act or module of identifying a first pattern from within an electronic circuit layout. The processes or modules also comprise identifying a fixing process or a replacement pattern for the first pattern and the act of performing pattern replacement or pattern fixing on the first pattern. The processes or modules may further comprise the act or module of searching the layout for patterns that match the first pattern, and the act or module of performing pattern replacement of pattern fixing on the patterns that match the first pattern. Some embodiments are also directed at articles of manufacture embodying a sequence of instructions for implementing the processes described here.

Abstract: Various embodiments are directed at methods and systems for implementing automatic fixing of a layout, implementing fuzzy pattern replacement, and implementing pattern capturing in a layout of an electronic circuit design. Various processes or modules comprise the act or module of identifying a first pattern from within an electronic circuit layout. The processes or modules also comprise identifying a fixing process or a replacement pattern for the first pattern and the act of performing pattern replacement or pattern fixing on the first pattern. The processes or modules may further comprise the act or module of searching the layout for patterns that match the first pattern, and the act or module of performing pattern replacement of pattern fixing on the patterns that match the first pattern. Some embodiments are also directed at articles of manufacture embodying a sequence of instructions for implementing the processes described here.

Abstract: Various embodiments are directed at methods and systems for implementing automatic fixing of a layout, implementing fuzzy pattern replacement, and implementing pattern capturing in a layout of an electronic circuit design. Various processes or modules comprise the act or module of identifying a first pattern from within an electronic circuit layout. The processes or modules also comprise identifying a fixing process or a replacement pattern for the first pattern and the act of performing pattern replacement or pattern fixing on the first pattern. The processes or modules may further comprise the act or module of searching the layout for patterns that match the first pattern, and the act or module of performing pattern replacement of pattern fixing on the patterns that match the first pattern. Some embodiments are also directed at articles of manufacture embodying a sequence of instructions for implementing the processes described here.

Abstract: A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Abstract: According to various embodiments of the invention, systems and methods for design rule checking enhanced with pattern matching is provided, wherein the design rule checker ignores certain patterns of the layout that violate design rules during validation. One embodiment of the invention includes receiving a first layout pattern that containing the original layout of an integrated circuit pattern. The pattern matcher processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet a design waiver. The pattern matcher generates a second layout pattern with the waived patterns marked. The design rule checker subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules.

Abstract: According to various embodiments of the invention, systems and methods for design rule checking enhanced with pattern matching is provided, wherein the design rule checker ignores certain patterns of the layout that violate design rules during validation. One embodiment of the invention includes receiving a first layout pattern that containing the original layout of an integrated circuit pattern. The pattern matcher processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet a design waiver. The pattern matcher generates a second layout pattern with the waived patterns marked. The design rule checker subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules.

Abstract: Images such as mask layouts, signatures, and photographs are compared to identify similarities or dissimilarities in the images. Descriptions of the images use geometric shapes including lines, rectangles, and triangles to facilitate the comparisons and decrease comparison time and decrease stored data describing the shapes. Data for pixels in the shapes are pre-integrated to reduce arithmetic operations in the comparisons.