Patents by Inventor Frank J. Loprest

Frank J. Loprest has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5441541
    Abstract: Complexes of anionic and cationic surfactants have been found to remove oily stains from fabrics remarkably better than either the cationic or anionic surfactant from which they are formed.
    Type: Grant
    Filed: January 31, 1992
    Date of Patent: August 15, 1995
    Assignee: Colgate Polmolive Co.
    Inventors: Ammanuel Mehreteab, Frank J. Loprest
  • Patent number: 5188752
    Abstract: A linear viscoelastic aqueous liquid automatic dishwasher detergent composition comprising water; up to about 2% by weight of long chain fatty acid or salt thereof; from about 0 to 5% by weight of organic detergent; from about 5 to 40% by weight of alkali metal detergent builder salt; up to about 20% by weight of a chlorine bleach compound; and 0.1 to 5.0% of a cross-linked copolymer of methyl vinyl ether and maleic anhydride which is crosslinked with at least about 0.5 weight % of an aliphatic diene having about 6 to about 20 carbon atoms.
    Type: Grant
    Filed: April 22, 1991
    Date of Patent: February 23, 1993
    Assignee: Colgate-Palmolive Company
    Inventors: Michael Prencipe, Elizabeth F. McCandlish, Frank J. Loprest
  • Patent number: 5176713
    Abstract: A non-aqueous liquid heavy duty laundry detergent composition in the form of a suspension of builder salt in liquid nonionic surfactant is stabilized against phase separation by the addition of small amounts of low density filler, such as hollow plastic or glass microspheres. The low density particulate filler is added in an amount to equalize the densities of the continuous liquid phase and the dispersed phase.
    Type: Grant
    Filed: May 8, 1989
    Date of Patent: January 5, 1993
    Assignee: Colgate-Palmolive Co.
    Inventors: Nagaraj S. Dixit, Frank J. Loprest, Kuo-Yann Lai
  • Patent number: 4256825
    Abstract: A photographic element, comprising a photographic base carrying a light-sensitive photographic silver halide emulsion layer and a photosensitive non-silver halide layer in operative association with said silver halide layer, said non-silver halide layer containing a light-sensitive composition selected from the group consisting of diazotype compositions, vesicular compositions and photosensitive polymers.
    Type: Grant
    Filed: June 8, 1979
    Date of Patent: March 17, 1981
    Assignee: GAF Corporation
    Inventor: Frank J. Loprest
  • Patent number: 4149888
    Abstract: Photographic masks, suitable for reproduction in a photoresist layer -- by exposure of the latter to actinic light under the mask, and development of the photo-resist image -- of the pattern of a microelectronic component or device, are made by exposure to light in accordance with an original (especially by contact exposure under a primary mask) containing the pattern to be reproduced, of light-sensitive material having a flat, rigid, dimensionally stable transparent base such as glass and a thin (e.g. 0.
    Type: Grant
    Filed: April 24, 1974
    Date of Patent: April 17, 1979
    Assignee: GAF Corporation
    Inventor: Frank J. Loprest
  • Patent number: 4132549
    Abstract: A photo-induced thermally degradable imaging system comprising a continuous, water-insoluble film of a peroxide copolymer of oxygen and a vinyl aromatic monomer having the structural formula: ##STR1## WHEREIN R.sub.1 can be hydrogen or an alkyl group containing from 1 to 4 carbon atoms, R.sub.2 is hydrogen, an alkyl group containing from 1 to 4 carbon atoms, an aryl group containing from 6 to 12 carbon atoms or a halogen atom and b is an integer from 1 to 2, on a substrate.
    Type: Grant
    Filed: November 19, 1976
    Date of Patent: January 2, 1979
    Assignee: GAF Corporation
    Inventors: Frank J. Loprest, Eugene F. McInerney
  • Patent number: 4093461
    Abstract: A positive working, thermally stable photoresist, comprising a light-sensitive orthoquinone diazide or naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine, and a support carrying a layer of said photoresist. After exposure, the image is developed in the layer with an alkaline aqueous developer and is unaffected by heating to 500.degree. C, thus allowing the use of the photoresist layer for plasma and sputter-etching as well as ion implantation.
    Type: Grant
    Filed: July 18, 1975
    Date of Patent: June 6, 1978
    Assignee: GAF Corporation
    Inventors: Frank J. Loprest, Eugene F. McInerney
  • Patent number: 4080246
    Abstract: An improved etchant solution for selectively etching unprotected areas of metal film from a substrate which comprises between about 65 and about 90 parts by weight phosphoric acid, between about 0.5 and about 5 parts by weight of a perchloric acid component and between about 9 and about 30 parts by weight water, which composition contains from 0 to about 5% by weight total volume of a neutral or anionic wetting agent. The invention also comprises the method of utilizing the etchant composition and the improved precision device produced thereby.
    Type: Grant
    Filed: June 29, 1976
    Date of Patent: March 21, 1978
    Assignee: GAF Corporation
    Inventors: Angelo J. Battisti, Frank J. Loprest