Abstract: A high-solids wastewater treatment system is disclosed. The wastewater treatment system includes a ballasted reactor, a solids-liquid separation subsystem, a pre-treatment subsystem, a ballast feed subsystem, and a ballast recovery subsystem. The high-solids wastewater treatment system can include a reaction tank, a thickener, and a filter press. A method of treating high-solids wastewater is also disclosed. The method includes contacting a wastewater feed with a coagulant or flocculant, thickening the dosed wastewater, treating the effluent with a ballast, settling the treated wastewater, and conveying the ballasted sludge to the wastewater feed, dosed wastewater, or treated wastewater. The wastewater feed may have more than 500 mg/L of total suspended solids. The wastewater feed may contain inorganic solids.

Abstract: A method for treating a waste stream from a copper CMP process including dissolved copper and abrasive particles having a number weighted mean size of less than 0.75 ?m includes introducing the waste stream into a feed tank, flowing the waste stream from the feed tank into an ultrafiltration module, filtering the waste stream through a membrane of the ultrafiltration module to form a solids-lean filtrate, directing the solids-lean filtrate from the ultrafiltration module through an ion exchange unit to remove dissolved copper and produce a treated aqueous solution having a lower copper concentration than the copper concentration of the waste stream, backwashing the membrane ultrafiltration module to remove the slurry solids from the membrane of the ultrafiltration module, and combining the removed slurry solids with the treated aqueous solution to form a combined discharge stream having a copper concentration suitable for discharge into the environment.

Abstract: Methods of treating CMP wastewater comprising azoles are disclosed. The method includes providing the wastewater having a first azole concentration, introducing the wastewater to an inlet of a wastewater treatment system constructed and arranged to produce and introduce free radicals into the wastewater, and activating the wastewater treatment system to produce and introduce the free radicals into the wastewater in an amount sufficient to reduce the azole concentration in the wastewater and produce treated water having a second azole concentration, less than the first azole concentration. Methods of facilitating treatment of CMP wastewater comprising azoles by providing a water treatment system constructed and arranged to produce and introduce free radicals into the wastewater are disclosed.

Abstract: A method of reducing a concentration of hydrogen peroxide from wastewater includes diluting the wastewater with water having a lower concentration of hydrogen peroxide than the wastewater to produce a diluted wastewater, contacting the diluted wastewater with a dissolved iron compound at an acidic pH to form a partially treated wastewater having a lower concentration of hydrogen peroxide than the diluted wastewater, and precipitating iron solids from the partially treated wastewater by raising a pH of the partially treated wastewater to form a neutralized partially treated wastewater.

Abstract: A high-solids wastewater treatment system is disclosed. The wastewater treatment system includes a ballasted reactor, a solids-liquid separation subsystem, a pre-treatment subsystem, a ballast feed subsystem, and a ballast recovery subsystem. The high-solids wastewater treatment system can include a reaction tank, a thickener, and a filter press. A method of treating high-solids wastewater is also disclosed. The method includes contacting a wastewater feed with a coagulant or flocculant, thickening the dosed wastewater, treating the effluent with a ballast, settling the treated wastewater, and conveying the ballasted sludge to the wastewater feed, dosed wastewater, or treated wastewater. The wastewater feed may have more than 500 mg/L of total suspended solids. The wastewater feed may contain inorganic solids.

Abstract: A system to remove contaminants from contaminated water contains a pre-concentrating subsystem, a contaminant removal subsystem or a biological subsystem configured to remove two or more contaminants, and a permeate blending subsystem. A process for removing contaminants from contaminated water includes concentrating contaminated water, treating concentrated contaminated water, and combining product water to produce environmentally acceptable product water.

Abstract: A system to remove contaminants from contaminated water contains a pre-concentrating subsystem, a contaminant removal subsystem or a biological subsystem configured to remove two or more contaminants, and a permeate blending subsystem. A process for removing contaminants from contaminated water includes concentrating contaminated water, treating concentrated contaminated water, and combining product water to produce environmentally acceptable product water.

Abstract: A method of reducing a concentration of hydrogen peroxide from wastewater includes diluting the wastewater with water having a lower concentration of hydrogen peroxide than the wastewater to produce a diluted wastewater, contacting the diluted wastewater with a dissolved iron compound at an acidic pH to form a partially treated wastewater having a lower concentration of hydrogen peroxide than the diluted wastewater, and precipitating iron solids from the partially treated wastewater by raising a pH of the partially treated wastewater to form a neutralized partially treated wastewater.

Abstract: A method of reducing the concentration of dissolved selenium in water includes introducing water having solid selenium-containing particles and a metal that bonds with selenium into a vessel and precipitating a metal-selenium compound from the water. A method of reducing the concentration of dissolved selenium or reducing dissolution of dissolved selenium, including providing a source of electrons into the water to precipitate dissolved selenium compounds is also disclosed. The precipitated compounds are separated from the water to produce decontaminated water. A system for reducing the concentration of dissolved selenium or reducing dissolution of dissolved selenium is also disclosed. The system includes a vessel fluidly connectable to a water source, at least one solid metal source, and a source of electrical voltage electrically connectable to the metal source.

Abstract: A system to remove contaminants from contaminated water contains a pre-concentrating subsystem, a contaminant removal subsystem or a biological subsystem configured to remove two or more contaminants, and a permeate blending subsystem. A process for removing contaminants from contaminated water includes concentrating contaminated water, treating concentrated contaminated water, and combining product water to produce environmentally acceptable product water.

Abstract: Systems and methods for treating wastewater are disclosed. Zero valent iron media may be used in a moving packed bed reactor. A media recovery system may return media to the reactor.

Abstract: A system to remove contaminants from contaminated water contains a pre-concentrating subsystem, a contaminant removal subsystem or a biological subsystem configured to remove two or more contaminants, and a permeate blending subsystem. A process for removing contaminants from contaminated water includes concentrating contaminated water, treating concentrated contaminated water, and combining product water to produce environmentally acceptable product water.

Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

Abstract: A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.