Abstract: Provided herein are phosphodiesterase 4 (PDE4) degraders, e.g., a compound of Formula (I) or (IA), and pharmaceutical compositions thereof. Also provided herein are methods of their use for treating, preventing, or ameliorating one or more symptoms of a PDE4-mediated disease, disorder, or condition.

Abstract: Systems, methods and apparatus for fractioning mixtures comprising combinations of volatiles, essentially non-volatiles and non-volatile solutes are disclosed. Embodiments of a burst atomization fractionation apparatus comprises an atomization chamber into which a liquid mixture is atomized across a pressure gradient. In various embodiments, a mixture for fractionation comprises mixtures of solvents, solvents and oils, used engine oil, or salt water. In various examples, a solute undergoes a chemical transformation during the fractionation process, such as dehydrogenation, dehydration, or decarboxylation.

Abstract: An apparatus for the manufacture of at least substantially hydrogen-free ta-C layers on substrates, which includes a vacuum chamber, which is connectable to an inert gas source and a vacuum pump, a support device in the vacuum chamber, at least one graphite cathode having an associated magnet arrangement forming a magnetron that serves as a source of carbon material, a bias power supply for applying a negative bias voltage to the substrates on the support device, at least one cathode power supply for the cathode, which is connectable to the at least one graphite cathode and to an associated anode and which is designed to transmit high power pulse sequences spaced at intervals of time, with each high power pulse sequence comprising a series of high frequency DC pulses adapted to be supplied, optionally after a build-up phase, to the at least one graphite cathode.

Abstract: An apparatus for the pretreatment and/or for the coating of an article in a vacuum chamber having at least one cathode arranged therein having at least one HIPIMS power source and also having a device which generates a tunnel-like magnetic field in front of the surface of the cathode, is characterized in that the device is designed in order to generate the tunnel-like magnetic field in front of a portion of the surface of the cathode and in that the device is displaceable relative to the cathode to allow the magnetic field to act in front of at least one further portion of the surface of the cathode. The device can consist of permanent magnets, which are displaced relative to the cathode, or of magnetic field generating coils, which can be movably arranged or stationary.

Abstract: A coating apparatus having a vacuum chamber, a plurality of cathodes arranged therein and also a HIPIMS power source, characterized in that in addition to at least one coating cathode which can be operated with the HIPIMS power source a plurality of etching cathodes is provided which are smaller in area in comparison to the coating cathode, with the etching cathodes being connectable in a predetermined or predeterminable sequence to the HIPIMS power source.

Abstract: A vacuum coating apparatus and method comprising a vacuum chamber, at least one pair of opposing cathodes, a power supply adapted to supply an AC voltage to said opposing cathodes to operate them in a dual magnetron sputtering mode, wherein at least one further cathode for PVD coating is provided in said vacuum chamber, characterized in that the at least one further cathode is a magnetron cathode and a further power supply is provided in the form of a pulsed power supply or a DC power supply is provided which is connectable to the magnetron cathode or arc cathode.

Abstract: A hemispatial neglect clipboard, the clipboard comprising: a board, the board comprising a front-side, and a back-side, a right edge and a left edge; a clip attached to generally the top of the board; at least one light located near either the right edge or left edge of the board; an on/off switch located on the front-side of the board; a power supply in signal communication with the on/off switch and the at least one light.

Abstract: A dual magnetron sputtering power supply for use with a magnetron sputtering apparatus having at least first and second sputtering cathodes for operation in the dual magnetron sputtering mode, there being a means for supplying a flow of reactive gas to each of said first (1) and second (4) cathodes via first (12) and second (14) flow control valves each associated with a respective one of said first and second cathodes and each adapted to control a flow of reactive gas to the respectively associated cathode, the power supply having, for each of said first and second cathodes a means for deriving a feed-back signal relating to the voltage prevailing at that cathode, a control circuit for controlling the flow of reactive gas to the respectively associated cathode by controlling the respective flow control valve and adapted to adjust the respective flow control valve to obtain a voltage feedback signal from the respective cathode corresponding to a set point value set for that cathode.