Patents by Inventor Frank Schrey

Frank Schrey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low temperature deposition of silicon oxides for device fabrication
    Patent number: 4708884
    Abstract: Conformal layers of a silicon oxide, such as silicon dioxide, are deposited at temperatures below 600 degrees C. through the decomposition of compounds such as diacetoxyditertiarybutoxysilane. The required temperatures do not significantly affect temperature-sensitive structures. Therefore, it is possible to form silicon oxide regions in the processing of devices having these structures. More generally, lowered-temperature processing can be applied to the deposition of other materials which include silicon oxide. For example, borophosphosilicate glasses can be deposited by chemical vapor deposition processing involving flash-evaporation of a mixture of liquid precursor reagents.
    Type: Grant
    Filed: June 18, 1986
    Date of Patent: November 24, 1987
    Assignee: American Telephone and Telegraph Company, AT&T Bell Laboratories
    Inventors: Edwin A. Chandross, Robert E. Dean, Patrick K. Gallagher, Roland A. Levy, Frank Schrey, Gerald Smolinsky