Abstract: The present invention provides a spectroscopic system and a transmission based imaging system for a spectroscopic system as well as a probe head for a transmission based imaging system for a spectroscopic system and a corresponding transmission based imaging method. The spectroscopic system is preferably applicable to in vivo noninvasive blood analysis. Transmission based imaging makes use of a transmitted portion of an imaging or monitoring beam that has been transmitted through biological tissue. By means of transmission based imaging, a contrast decreasing impact of scattered radiation can be effectively reduced. Additionally, by arranging the imaging light source opposite to an objective lens of the spectroscopic system, unintended propagation of spectroscopic excitation radiation into free space can be effectively prevented.

Abstract: A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

Abstract: The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.

Abstract: In the described method of producing a plurality of bodies bearing equal imprints of a stamp as optical structures, a stamp (13) is initially produced, by attaching particles (14) to a surface (15) of an auxiliary body (16); than, the stamp (13) is used to produce an imprint (11) on a plurality of bodies (10). Optical structures can be irradiated, producing on a screen a speckle pattern indicative of a key. It is substantially impossible to clone a given optical structure with current technological means. Optical structures represent physical One-Way Functions, easy to compute in the forward sense but unfeasible to reverse. Thus, they can be used to build an access/copy protection system of user information contained in an information carrier associated with the body 10. The reproducibility of the optical structures makes this method suitable for optical disks.

Abstract: A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

Abstract: A monitoring system for dark-field imaging of a target area (72) below a surface (70) of an object, e.g., capillary vessel under the surface of the skin of a patient, comprises an illumination optical system (31), an imaging system (35), and a selective optical interception system for suppressing illumination light returning from the region between the surface of the object and the target area. The interception system may comprise crossed polarizers (32, 37) in the illumination and imagining paths, respectively, and/or an aperture stop (51) arranged to intercept a central portion of the returning imaging beam. Alternatively, the illumination and imaging paths subtend an angle and the illumination focus and the imaging focus are displaced relative to each other. The monitoring system may be comprised in an analysis apparatus further comprising a spectroscopy system having an excitation system and a detection system.

Abstract: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

Abstract: The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.

Abstract: A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

Abstract: A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

Abstract: A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

Abstract: A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

Abstract: A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

Abstract: According to this invention, a side-emitting illumination device for uniformly distributing light is composed of an LED light source, a light-transmitting rod which permits total internal reflection, and outcoupling material affixed to an outer surface of the rod. Light enters the rod at one end and travels along the rod by total internal reflection. Light that hits the outcoupling material is angularly distributed based on the width of the outcoupling material.

Abstract: An LED array is controlled by determining a constant relating the peak light output of an LED to the peak driving current of a PWM pulse driving the LED, and multiplying the average current of the PWM pulse by the constant to obtain a value of average light output for the LED. The constant may be determined by simultaneously measuring peak light output of the LED and peak current of a PWM pulse driving the LED. The constant is then calculated by dividing the peak light output by the peak current of the PWM pulse. By making the simultaneous measurements at a time during the duration of the PWM pulse where the pulse has reached its full magnitude, rise and fall times of the pulse do not affect the measurements. The average current of the PWM pulse may be determined by a variety of methods including integrating current in the PWM pulse over time, or passing the PWM current through a low pass filter configured for providing an average value of PWM current.

Abstract: An LED array is controlled by determining a constant relating the peak light output of an LED to the peak driving current of a PWM pulse driving the LED, and multiplying the average current of the PWM pulse by the constant to obtain a value of average light output for the LED. The constant may be determined by simultaneously measuring peak light output of the LED and peak current of a PWM pulse driving the LED. The constant is then calculated by dividing the peak light output by the peak current of the PWM pulse. By making the simultaneous measurements at a time during the duration of the PWM pulse where the pulse has reached its full magnitude, rise and fall times of the pulse do not affect the measurements. The average current of the PWM pulse may be determined by a variety of methods including integrating current in the PWM pulse over time, or passing the PWM current through a low pass filter configured for providing an average value of PWM current.