Patents by Inventor Franklin Chang Diaz

Franklin Chang Diaz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA SOURCE WITH AN RF COUPLING SYSTEM AND METHOD OF OPERATING THEREOF
    Publication number: 20160205759
    Abstract: An RF based, gridless plasma source comprising an RF coupler, an ionization chamber comprising a flow inlet, an upstream manifold, a flow exit, and a reasonably RF transparent gas containment tube that allows RF power to couple to the plasma inside the ionization chamber, and a choke restriction downstream; and a method of using the plasma source comprising a step of tailoring an energy distribution of extracted plasma.
    Type: Application
    Filed: March 18, 2016
    Publication date: July 14, 2016
    Inventors: Franklin Chang Diaz, Jared Squire, Tim Glover, Mark Carter
  • PLASMA SOURCE
    Publication number: 20140217893
    Abstract: A plasma source comprising an RF coupling system, magnets or coils that generate magnetic fields, a gas injection system, and a vacuum tight RF transparent gas containment tube, wherein said RF coupling system comprises an RF coupler and said plasma source further comprises a choke point wherein the ratio of the field strength at said choke point to the field strength at said RF coupler is greater than two.
    Type: Application
    Filed: November 26, 2013
    Publication date: August 7, 2014
    Inventors: Franklin Chang Diaz, Jared Squire, Tim Glover, Leonard Cassady, Mark Carter, Greg McCaskill
  • Plasma source improved with an RF coupling system
    Patent number: 8593064
    Abstract: A plasma source comprising an RF coupling system, magnets or coils that generate magnetic fields, a gas injection system, and a vacuum tight, RF transparent gas containment tube, wherein the RF coupling system comprises an RF coupler and the plasma source further comprises a choke point wherein the ratio of the field strength at said choke point to the field strength at said RF coupler is greater than two.
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: November 26, 2013
    Assignee: AD Astra Rocket Company
    Inventor: Franklin Chang Diaz
  • PLASMA SOURCE
    Publication number: 20100213851
    Abstract: An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magnetic means which are strengthened on the downstream end of the first stage, to control the plasma flux, ionization fraction, spatial distribution.
    Type: Application
    Filed: February 19, 2008
    Publication date: August 26, 2010
    Applicant: AD ASTRA ROCKET COMPANY
    Inventor: Franklin Chang Diaz