Patents by Inventor Frans C. De Schrijver

Frans C. De Schrijver has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4990421
    Abstract: An electrophotographic recording material comprising a conductive support and a photosensitive layer containing a photoconductive compound that has p-type charge generating capacity and is a trisazo compound which is the reaction product of the coupling reaction between a coupler compound that does not contain a carboxylic acid or sulphonic acid group and a diazonium salt represented by the following general formula (I): ##STR1## wherein: each of L, M and Y (same or different) represents a phenylene group including a phenylene groups substituted with one or more substituents selected from the group consisting of lower alkyl (C.sub.1 -C.sub.2), nitro, methoxy, ethoxy or halogen, or represents said phenylene group fused-on with the necessary atoms to close a saturated or unsaturated carbocyclic or heterocyclic ring or ring system including said ring or ring-system in substituted form, and X.sup.- is an anion.
    Type: Grant
    Filed: July 14, 1989
    Date of Patent: February 5, 1991
    Assignee: Agfa-Gevaert, N.V.
    Inventors: David R. Terrell, Marcel J. Monbaliu, Carina Geelen, Guy P. Verbeek, Frans C. De Schrijver, Mark G. Van der Auweraer
  • Patent number: 4923774
    Abstract: An electrophotographic recording material comprising a conductive support and a photosensitive layer containing a photoconductive compound that has p-type charge transport capacity and corresponds to the following general formula (I): ##STR1## wherein: R.sup.1 represents a --NR.sup.3 R.sup.4 group, wherein each of R.sup.3 and R.sup.4 (same or different) represents a C.sub.1 -C.sub.10 alkyl group including said alkyl group in substituted form, a cycloalkyl group, or an aryl group, andR.sup.2 represents hydrogen, an alkyl group including a substituted alkyl group or halogen.
    Type: Grant
    Filed: June 16, 1989
    Date of Patent: May 8, 1990
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Mark G. Van der Auweraer, Frans C. De Schrijver, Guy P. Verbeek, Carina Geelen, David R. Terrell, Stefaan K. De Meutter