Patents by Inventor Fransiscus Hendrikus Van Deuren

Fransiscus Hendrikus Van Deuren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Patent number: 7612867
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Grant
    Filed: August 11, 2008
    Date of Patent: November 3, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
  • Lithographic apparatus
    Publication number: 20090002676
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Application
    Filed: August 11, 2008
    Publication date: January 1, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
  • Lithographic apparatus
    Patent number: 7423730
    Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
    Type: Grant
    Filed: May 19, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters