Patents by Inventor Fransiscus J. M. Van Den Besselaar

Fransiscus J. M. Van Den Besselaar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5689544
    Abstract: An X-ray examination apparatus includes a beam diaphragm (3) with an X-ray absorbing shutter (4, 31, 32) which is arranged between the X-ray source (1) and the X-ray detector (9) in order to intercept parts of the X-ray beam (2), thus forming a limited X-ray beam (7). The shutter (4, 31, 32) can be displaced according to different degrees of freedom by different rotations of control rings (21, 22, 41, 42, 47, 48) whereto the shutter (4, 31, 32) is coupled. Because the shutter (4, 31, 32) can be moved to practically any desired position within the X-ray beam (2), the beam diaphragm (3) can shape the cross-section of the limited X-ray beam (7) in such a manner that essentially only a part (5) of a patient (6) to be examined is exposed to X-rays.
    Type: Grant
    Filed: November 13, 1995
    Date of Patent: November 18, 1997
    Assignee: U.S. Philips Corporation
    Inventor: Fransiscus J. M. Van Den Besselaar