Abstract: A lithographic projection apparatus includes a radiation system to supply a projection beam of radiation; a mask table provided with a mask holder to hold a mask; a substrate table provided with a substrate holder to hold a substrate; a projection system to image an irradiated portion of the mask onto a target portion of the substrate; and a preparatory station comprising an intermediate table on which a substrate can be positioned before transfer to the substrate table; the intermediate table including a major surface provided with a plurality of apertures, and gas bearing generator that generates a gas bearing between the major surface and a substrate located thereon.

Abstract: A pre-aligner receives wafers from a wafer carrier or process track and performs preparatory steps such as centering of the wafer. The prepared wafer is transferred to the wafer table using a robot arm that is isolated from the pre-aligner and the wafer table. The robot arm couples to the pre-aligner to pick up the wafer, decouples, couples to the wafer table and deposits the wafer. Positional accuracy of the wafer is thereby maintained during the transfer.

Abstract: An optical lithographic device having a machine frame (1) to which is fastened a lens system (11) having a vertical optical main axis (13). Below the lens system (11), a positioning device (35) is fastened on a support member (3) of the machine frame (1), by means of which device an object table (27) is displaceable relative to the lens system (11) over a guide surface (5) of the support member (3) extending perpendicular to the optical main axis (13).The device is provided with a force actuator system (67) fastened to a reference frame (83) and controlled by a feedforward control system (95). The force actuator system (67) exerts a compensatory force on the support member (3) with a direction opposite to a direction of a reaction force simultaneously exerted by the positioning device (35) on the support member (3), and with a value which is substantially equal to a value of the said reaction force.

Abstract: A lithographic device with a lithographic irradiation system (1, 13) which is fastened near a lower side to a mounting member (5) of a frame (7). The device is provided with a unit (65) which is formed by a positioning device (37), with which an object table (21) arranged below the irradiation system (1, 13) is displaceable, and by a support member (35), over which the object table (21) is guided by means of an aerostatic foot (31). In an operational position, the unit (65) is coupled to a carrier (67) by means of coupling members (73), the carrier (67) being suspended from the mounting member (5) by means of suspension elements (79, 81, 83), so that the unit (65) is arranged between lower frame supports (25) of the frame (7) and a compact construction is obtained.The unit (65) can be rotated from the operational position to an end position, in which the unit (65) is entirely outside the frame (7) and is easily accessible for maintenance, by means of a rotation mechanism (87) and a swivel mechanism (89).