Patents by Inventor Fred Stevie

Fred Stevie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7342225
    Abstract: A system (70) for crystallography including a sample holder (74), an electron source (76) for generating an electron beam, and a scanning actuator (80) for controlling the relative movement between the electron beam and the crystalline sample, the scanning actuator being controllable for directing the electron beam at a series of spaced apart points within the sample area. The system also includes an image processor (84) for generating crystallographic data based upon electron diffraction from the crystalline sample and for determining whether sufficient data have been acquired to characterize the sample area. The system further includes a controller (86) for controlling the scanning actuator to space the points apart such that acquired data is representative of a different grains within the crystalline sample. IN other embodiments, the invention includes one or more ion beams (178, 188) for crystallography and a combination ion beam/electron beam (218, 228).
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: March 11, 2008
    Assignee: Agere Systems, Inc.
    Inventors: Erik C. Houge, Brian Kempshall, Stephen M. Schwarz, Fred A. Stevie
  • Patent number: 7009487
    Abstract: The method for the fabrication of nano scale temperature sensors and nano scale heaters using focused ion beam (FIB) techniques. The process used to deposit metal nano strips to form a sensor is ion beam assisted chemical vapor deposition (CVD). The FIB Ga+ ion beam can be used to decompose W(CO)6 molecules to deposit a tungsten nano-strip on a suitable substrate. The same substrate can also be used for Pt nano-strip deposition. The precursors for the Pt can be trimethyl platinum (CH3)3Pt in the present case. Because of the Ga+ beam used in the deposition, both Pt and W nano-strips can contain a certain percentage of Ga impurities, which we denoted as Pt(Ga) and W(Ga) respectively. Our characterization of the response of this Pt(Ga)/W(Ga) nano scale junction indicates it has a temperature coefficient of approximately 5.4 mV/° C. This is a factor of approximately 130 larger than the conventional K-type thermocouples.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: March 7, 2006
    Assignee: University of Central Florida Research Foundation, Inc.
    Inventors: Lee Chow, Dan Zhou, Fred Stevie
  • Patent number: 6905736
    Abstract: The method for the fabrication of nano scale temperature sensors and nano scale heaters using focused ion beam (FIB) techniques. The process used to deposit metal nano strips to form a sensor is ion beam assisted chemical vapor deposition (CVD). The FIB Ga+ ion beam can be used to decompose W(CO)6 molecules to deposit a tungsten nano-strip on a suitable substrate. The same substrate can also be used for Pt nano-strip deposition. The precursors for the Pt can be trimethyl platinum (CH3)3Pt in the present case. Because of the Ga+ beam used in the deposition, both Pt and W nano-strips can contain a certain percentage of Ga impurities, which we denoted as Pt(Ga) and W(Ga) respectively. Our characterization of the response of this Pt(Ga)/W(Ga) nano scale junction indicates it has a temperature coefficient of approximately 5.4 mV/° C. This is a factor of approximately 130 larger than the conventional K-type thermocouples.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: June 14, 2005
    Assignee: University of Central Florida
    Inventors: Lee Chow, Dan Zhou, Fred Stevie
  • Patent number: 6627885
    Abstract: The present invention provides a method of forming a dynamic template with a focused beam. The method includes forming a desired template that represents a desired image, forming an actual template that represents an actual image, such as a photolithographic mask or a semiconductor device feature, and comparing the desired template to the actual template to yield a deviation template. In one embodiment the deviation template is formed by subtracting the actual template from the desired template.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: September 30, 2003
    Assignee: Agere Systems Inc.
    Inventors: John M. McIntosh, Erik C. Houge, Fred A. Stevie, Catherine Vartuli, Scott Jessen
  • Patent number: 6577970
    Abstract: The present invention provides a method of determining a crystallographic quality of a material located on a substrate. The method includes determining a set of crystallographic solutions for an unknown crystallographic orientation, and subsequently comparing the set of crystallographic solutions to adjacent known crystallographic orientations to determine the unknown crystallographic orientation. In a preferred embodiment, the set of crystallographic solutions may be a rank of crystallographic solutions which may represent the most probable crystallographic orientations. The rank of crystallographic solutions, in an alternative embodiment, may be represented by a vote, a fit and a confidence index.
    Type: Grant
    Filed: March 8, 2001
    Date of Patent: June 10, 2003
    Assignee: Agere Systems Inc.
    Inventors: Erik C. Houge, John M. McIntosh, Larry E. Plew, Fred A. Stevie, Catherine Vartuli
  • Publication number: 20020150509
    Abstract: The present invention provides a sampler for collecting a specimen of a substance. In one embodiment, the sampler comprises a sampler body, a platen having first and second opposing sides wherein the first side is coupleable to an end of the sampler body, and a sampling medium coupleable to the second side and configured to retain a specimen of a substance thereon.
    Type: Application
    Filed: April 17, 2001
    Publication date: October 17, 2002
    Inventors: Erik C. Houge, John M. McIntosh, Larry E. Plew, Fred A. Stevie, Catherine B. Vartuli
  • Publication number: 20020128789
    Abstract: The present invention provides a method of determining a crystallographic quality of a material located on a substrate. The method includes determining a set of crystallographic solutions for an unknown crystallographic orientation, and subsequently comparing the set of crystallographic solutions to adjacent known crystallographic orientations to determine the unknown crystallographic orientation. In a preferred embodiment, the set of crystallographic solutions may be a rank of crystallographic solutions which may represent the most probable crystallographic orientations. The rank of crystallographic solutions, in an alternative embodiment, may be represented by a vote, a fit and a confidence index.
    Type: Application
    Filed: March 8, 2001
    Publication date: September 12, 2002
    Inventors: Erik C. Houge, John M. McIntosh, Larry E. Plew, Fred A. Stevie, Catherine Vartuli
  • Patent number: 4861126
    Abstract: Ionic drift in integrated optical devices is reduced by the utilization of a gettering layer interposed between the surface dielectric and the electrodes. The material used to form this layer is capable of gettering the mobile ions at a relatively low temperature (for example <600.degree. C.).
    Type: Grant
    Filed: May 5, 1988
    Date of Patent: August 29, 1989
    Assignee: American Telephone and Telegraph Company, AT&T Bell Laboratories
    Inventors: Mindaugas F. Dautartas, Alain S. Harrus, Edward P. Martin, Jr., Fred A. Stevie