Patents by Inventor Frederick A. Palenschat
Frederick A. Palenschat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8855166Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: GrantFiled: January 17, 2012Date of Patent: October 7, 2014Assignee: Cymer, LLCInventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Publication number: 20120120974Abstract: A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.Type: ApplicationFiled: January 17, 2012Publication date: May 17, 2012Inventors: Richard C. Ujazdowski, Richard M. Ness, J. Martin Algots, Vladimir B. Fleurov, Frederick A. Palenschat, Walter D. Gillespie, Bryan G. Moosman, Thomas D. Steiger, Brett D. Smith, Thomas E. McKelvey
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Publication number: 20080197297Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site.Type: ApplicationFiled: June 20, 2006Publication date: August 21, 2008Inventors: Robert P. Akins, Richard L. Sandstrom, William N. Partlo, Igor V. Fomenkov, Thomas D. Steiger, John Martin Algots, Norbert Bowering, Robert N. Jacques, Frederick Palenschat, Jun Song
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Publication number: 20060222034Abstract: A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.Type: ApplicationFiled: March 31, 2005Publication date: October 5, 2006Applicant: Cymer, Inc.Inventors: Richard Ujazdowski, Richard Ness, J. Algots, Vladimir Fleurov, Frederick Palenschat, Walter Gillespie, Bryan Moosman, Thomas Steiger, Brett Smith, Thomas McKelvey
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Patent number: 7087914Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site.Type: GrantFiled: March 17, 2004Date of Patent: August 8, 2006Assignee: Cymer, INCInventors: Robert P. Akins, Richard L. Sandstrom, William N. Partlo, Igor V. Fomenkov, John Martin Algots, Robert N. Jacques, Frederick Palenschat, Jun Song
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Publication number: 20050205810Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site.Type: ApplicationFiled: March 17, 2004Publication date: September 22, 2005Inventors: Robert Akins, Richard Sandstrom, William Partlo, Igor Fomenkov, Thomas Steiger, John Algots, Norbert Bowering, Robert Jacques, Frederick Palenschat, Jun Song
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Patent number: 6914919Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation.Type: GrantFiled: June 28, 2002Date of Patent: July 5, 2005Assignee: Cymer, Inc.Inventors: Tom A. Watson, Richard C. Ujazdowski, Alex P. Ivaschenko, Richard L. Sandstrom, Robert A. Shannon, R. Kyle Webb, Frederick A. Palenschat, Thomas Hofmann, Curtis L. Rettig, Richard M. Ness, Paul C. Melcher, Alexander I. Ershov
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Publication number: 20040160155Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber.Type: ApplicationFiled: December 18, 2003Publication date: August 19, 2004Inventors: William N. Partlo, Gerry M. Blumenstock, Norbert Bowering, Kent Bruzzone, Dennis Cobb, Timothy S. Dyer, John Dunlop, Igor V. Fomenkov, James Christopher Hysham, I. Roger Oliver, Frederick Palenschat, Xiaojiang Pan, Curtis L. Rettig, Rodney D. Simmons, John Walker, R. Kyle Webb, Thomas Hofmann
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Patent number: 6650666Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver.Type: GrantFiled: December 21, 2001Date of Patent: November 18, 2003Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Robert N. Jacques, John A. Rule, Frederick A. Palenschat, Igor V. Fomenkov, John M. Algots, Jacob P. Lipcon, Richard L. Sandstrom
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Patent number: 6532247Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.Type: GrantFiled: February 27, 2001Date of Patent: March 11, 2003Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Robert N. Jacques, George J. Everage, Stuart L. Anderson, Frederick A. Palenschat, Igor V. Fomenkov, Richard L. Sandstrom, William N. Partlo, John M. Algots, Daniel J. W. Brown
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Publication number: 20030012234Abstract: The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation.Type: ApplicationFiled: June 28, 2002Publication date: January 16, 2003Inventors: Tom A. Watson, Richard C. Ujazdowski, Alex P. Ivaschenko, Richard L. Sandstrom, Robert A. Shannon, R. Kyle Webb, Frederick A. Palenschat, Thomas Hofmann, Curtis L. Rettig, Richard M. Ness, Paul C. Melcher, Alexander I. Ershov
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Publication number: 20020154669Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver.Type: ApplicationFiled: December 21, 2001Publication date: October 24, 2002Inventors: Ronald L. Spangler, Robert N. Jacques, John A. Rule, Frederick A. Palenschat, Igor V. Fomenkov, John M. Algots, Jacob P. Lipcon, Richard L. Sandstrom
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Publication number: 20020006149Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.Type: ApplicationFiled: February 27, 2001Publication date: January 17, 2002Inventors: Ronald L. Spangler, Robert N. Jacques, George J. Everage, Stuart L. Anderson, Frederick A. Palenschat, Igor V. Fomenkov, Richard L. Sandstrom, William N. Partlo, John M. Algots, Daniel J.W. Brown