Abstract: A vaporization chamber for a substrate processing system comprises a main body, a cover member and a transition member. The main body is made of aluminum and defines a first inner surface, which defines, at least in part, a cavity. The cover member is also made of aluminum. The cover member defines a second inner surface, which also defines, at least in part, the cavity. The cover member comprises a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extends from a first outer surface through the cover member to the second inner surface. The transition member is made of stainless steel and has a transition outer surface and a transition inner surface. The transition inner surface is aluminum cladded. The cover member comprising a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to second inner surface. The transition inner surface and the cover outer surface are welded together.

Abstract: A flow control system disrupts a reactive flow into a process chamber in order to shape the flow geometry issuing into a substrate processing chamber. In one embodiment, gas is injected into a chamber inlet in a direction which disrupts the reactive flow traveling through the chamber inlet. In another embodiment, an insert in the chamber inlet disrupts the reactive flow traveling through the chamber inlet into the process chamber.