Abstract: A system for implanting ions of a prearranged chemical species into a plurality of semiconductor wafers. A beam analyzing arrangement receives an ion beam and selective separates various ion species in the beam on the basis of mass to produce an analyzed beam exiting the analyzing arrangement. A wafer scanning arrangement scans a plurality of wafers through the accelerated ion beam. The analyzing arrangement has an ion dispersion plane associated therewith and the source arrangement has an associated ion emitting envelope including an area pf substantial extension in a plane parallel to the ion dispersion plane and produces an ion beam characterized by a beam envelope which retains an area of substantial extension in a plane paralled to ion dispersion plane throughout the region between the source and the analyzing arrangement and by ions entering the analyzing arrangement travelling substantially either toward or from a common apparent line object perpendicular to the ion dispersion plane.

Abstract: A system and methods for handling semiconductor wafers and dummy wafers in semiconductor process equipment such as an ion implanter. Tray assemblies are provided, each of which is adapted for releasably holding and automatically aligning a standard semiconductor wafer cassette next to a dedicated dummy-wafer cassette. The dummy wafers are used to complete a full load of wafers when there are insufficient wafers in the standard cassette. The trays are mounted on the paddles of a load lock carousel, which indexes the trays to an unloading/loading station. There, an indexer assembly picks up and indexes the tray so that the standard and dummy wafers can be selectively lifted by a vertical transport mechanism to a pivotal wafer chuck for transfer into the process equipment.

Abstract: A dual mechanical movement scanning system for ion implantation includes a radial scan arm which is mounted at a fixed pivot point external to the system vacuum chamber and penetrates the chamber and supports the wafer paddle or wheel within the chamber. The fast-scan component is provided by rotation of the paddle on the support arm; the slow-scan component is provided by pivotal movement of the scan arm itself. The drive system which reciprocally pivots the radial scan arm is configured geometrically so that controlled movement of one arm of the drive system is translated as l/r velocity of the rotational axis relative to the beam path. The wafer paddle can be constructed to provide a variable implant angle and to use a component of centrifugal force to hold the wafers in place without clamps or other mechanical means.