Patents by Inventor Frits Van Der Meulen

Frits Van Der Meulen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas mixing for fast temperature control of a cooling hood
    Patent number: 11681233
    Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: June 20, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joost De Hoogh, Alain Louis Claude Leroux, Alexander Marinus Arnoldus Huijberts, Christiaan Louis Valentin, Robert Coenraad Wit, Dries Vaast Paul Hemschoote, Frits Van Der Meulen, Johannes Franciscus Martinus Van Santvoort, Radu Donose
  • GAS MIXING FOR FAST TEMPERATURE CONTROL OF A COOLING HOOD
    Publication number: 20210356875
    Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.
    Type: Application
    Filed: September 26, 2019
    Publication date: November 18, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joost DE HOOGH, Alain Louis Claude LEROUX, Alexander Marinus Arnoldus HUIJBERTS, Christiaan Louis VALENTIN, Robert Coenraad WIT, Dries Vaast Paul HEMSCHOOTE, Frits VAN DER MEULEN, Johannes Franciscus Martinus VAN SANTVOORT, Radu DONOSE
  • Mask assembly
    Patent number: 11009803
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: May 18, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Pellicle attachment apparatus
    Patent number: 11003098
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Pellicle attachment apparatus
    Patent number: 10969701
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: April 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Lithographic apparatus
    Patent number: 10747127
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: August 18, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
  • Lithographic apparatus and device manufacturing method
    Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Stage system, lithographic apparatus and device manufacturing method
    Patent number: 10620552
    Abstract: The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.
    Type: Grant
    Filed: May 5, 2017
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrikus Herman Marie Cox, Ronald Cornelis Gerardus Gijzen, Patrick Willem Paul Limpens, Bart Friso Riedstra, Frits van der Meulen
  • Pellicle Attachment Apparatus
    Publication number: 20200096882
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: November 18, 2019
    Publication date: March 26, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits VAN DER MEULEN, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Jeroen DEKKERS, Paul JANSSEN, Ronald Harm Gunther KRAMER, Matthias KRUIZINGA, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Erik Roelof LOOPSTRA, Gerrit VAN DEN BOSCH, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE, Angelo Cesar Peter DE KLERK, Jacobus Maria DINGS, Maurice Leonardus Johannes JANSSEN, Roland Jacobus Johannes KERSTENS, Martinus Jozef Maria KESTERS, Michel LOOS, Geert MIDDEL, Silvester Matheus REIJNDERS, Frank Johannes Christiaan THEUERZEIT, Anne Johannes Wilhelmus VAN LIEVENOOGEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 10599054
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: March 24, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Mask Assembly
    Publication number: 20200057394
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 30, 2019
    Publication date: February 20, 2020
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
  • Mask assembly
    Patent number: 10558129
    Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: February 11, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Pellicle attachment apparatus
    Patent number: 10539886
    Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Pellicle Attachment Apparatus
    Publication number: 20200012204
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm, Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Lithographic apparatus and device manufacturing method
    Patent number: 10466595
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: November 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • STAGE SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190294057
    Abstract: The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.
    Type: Application
    Filed: May 5, 2017
    Publication date: September 26, 2019
    Inventors: Hendrikus Herman Marie Cox, Ronald Cornelis Gerardus Gijzen, Patrick Willem Paul Limpens, Bart Friso Riedstra, Frits van der Meulen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190294058
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: June 12, 2019
    Publication date: September 26, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Lithographic apparatus
    Patent number: 10394140
    Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrikus Herman Marie Cox, Paul Corné Henri De Wit, Arie Jeffrey Den Boef, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Frits Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden
  • Lithographic Apparatus
    Publication number: 20190227445
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: August 11, 2017
    Publication date: July 25, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Frits VAN DER MEULEN, Erik Johan ARLEMARK, Hendrikus Herman Marie COX, Martinus Agnes Willem CUIJPERS, Joost DE HOOGH, Gosse Charles DE VRIES, Paul Comé Henri DE WIT, Sander Catharina Reinier DERKS, Ronald Comelis Gerardus GIJZEN, Dries Vaast Paul HEMSCHOOTE, Christiaan Alexander HOOGENDAM, Adrianus Hendrik KOEVOETS, Raymond Wilhelmus Louis LAFARRE, Alain Louis Claude LEROUX, Patrick Willem Paul LIMPENS, Jim Vincent OVERKAMP, Christiaan Louis VALENTIN, Koos VAN BERKEL, Stan Henricus VAN DER MEULEN, Jacobus Comelis Gerardus VAN DER SANDEN, Harmen Klaas VAN DER SCHOOT, David Ferdinand VLES, Evert Auke Rinze WESTERHUIS
  • Lithographic apparatus and device manufacturing method
    Patent number: 10331047
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: June 25, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel