Abstract: The granule consists of individual granules approximately spherical in shape, having a pore volume of 0.5 cm3, a mean diameter of pores of 50 nm or less, a specific surface area of 100 m2/g or less, and a bulk density of 0.7 g/cm3 or higher. It is produced by dispersing a fumed silica obtained by hydrolysis of a silicon compound into pure water to obtain a slurry, and drying the slurry. The granule is used for producing high purity synthetic quartz glass powder. The method further comprises: a first heat treatment under an oxygen-containing atmosphere, a second heat treatment in a temperature range of from 600 to 1100° C., and a third heat treatment in a temperature range of from 1100 to 1300° C. under an atmosphere containing hydrogen chloride; and a step of densification comprising calcining the product at a temperature not higher than 1500° C. under vacuum or in an atmosphere of gaseous hydrogen or gaseous helium.

Abstract: A method is provided for the manufacture of SiO.sub.2 granular material. Silicic acid is dispersed in a liquid to form a dispersion. The dispersion is stirred in a stirring tank with formation of a homogeneous liquid phase. The homogeneous liquid phase is maintained by stirring at a substantially constant rate until the granular mass develops, when the solids content of the dispersion is within the range of 65 to 80 weight percent. Moisture is gradually extracted to form a granular mass which is dried and sintered.