Patents by Inventor Fu-Chien LIU

Fu-Chien LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive resin composition and manufacturing method of the same, black matrix, pixel layer, protection film, color filter, and liquid crystal display apparatus
    Patent number: 10495919
    Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: December 3, 2019
    Assignee: Chi Mei Corporation
    Inventors: Fu-Chien Liu, Hao-Wei Liao
  • PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF THE SAME, BLACK MATRIX, PIXEL LAYER, PROTECTION FILM, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS
    Publication number: 20190049780
    Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.
    Type: Application
    Filed: August 13, 2018
    Publication date: February 14, 2019
    Applicant: Chi Mei Corporation
    Inventors: Fu-Chien Liu, Hao-Wei Liao
  • ALKALI-SOLUBLE RESIN COMPONENT AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
    Publication number: 20150175794
    Abstract: An alkali-soluble resin component includes a bisphenol fluorene-based resin, a quaternary ammonium salt compound, and a solvent. The quaternary ammonium salt compound is in an amount greater than 0.07 part by weight and smaller than 0.82 part by weight based on 100 parts by weight of the bisphenol fluorene-based resin.
    Type: Application
    Filed: July 16, 2014
    Publication date: June 25, 2015
    Inventor: Fu-Chien LIU