Patents by Inventor Fu-Lun Lui

Fu-Lun Lui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS FOR IN-SITU SUBSTRATE PROCESSING
    Publication number: 20100108262
    Abstract: A plasma processing system (system) for processing a substrate is provided. The system includes a gas distribution system and a gas flow control assembly coupled to the gas distribution system. The gas flow control assembly is configured to control the input gases provided by the gas distribution system. The plasma processing system also includes a first set of nozzles coupled to the gas flow control assembly and configured to supply a first set of gases for processing a first portion of the substrate. The plasma processing system further includes a second set of nozzles coupled to the gas flow control assembly and configured to supply a second set of gases for processing a second portion of the substrate. The flow rate of the first set of gases is different from a flow rate of the second set of gases.
    Type: Application
    Filed: January 7, 2010
    Publication date: May 6, 2010
    Inventors: Guang-Yaw Hwang, Fu-Lun Lui, Yu-Wei Yang