Patents by Inventor Fumiaki Tambo

Fumiaki Tambo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6395440
    Abstract: An electrophotographic photoreceptor having a bipolar charge transport layer with a hole-transporting property and an electron-transporting property, the bipolar charge transport layer containing a block copolymer or a graft copolymer, and a process cartridge and an electrophotographic apparatus using the electrophotographic photoreceptor. The electrophotographic photoreceptor has a high performance and a long life and can provide various properties required for a photoreceptor by forming, the bipolar charge transport layer which is excellent in hole- and electron-transporting properties, mechanical strengths, a discharge product resistance and a coating dispersion stability, and the process cartridge and the electrophotographic apparatus using the electrophotographic photoreceptor can provide a high performance and a high durability.
    Type: Grant
    Filed: November 7, 2000
    Date of Patent: May 28, 2002
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yasuhiro Yamaguchi, Masakazu Iijima, Fumiaki Tambo, Masahiro Iwasaki, Taketoshi Hoshizaki, Yasuo Sakaguchi
  • Patent number: 6045856
    Abstract: A resistive element is produced by forming a substrate glazed with glass, printing or coating a resistive element-forming paste onto the substrate, calcining the paste in a first heating step to form an element comprising a film on the substrate and subjecting the resulting element to a heat treatment in a second heating step to diffuse an amount of glass into the film to increase resistivity of the element.
    Type: Grant
    Filed: April 29, 1994
    Date of Patent: April 4, 2000
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Kaoru Torikoshi, Katsuhiro Sato, Hiroyuki Tanaka, Fumiaki Tambo, Yutaka Akasaki
  • Patent number: 6020426
    Abstract: A charge transporting block and an insulating block are block copolymerized or graft copolymerized to form a charge transporting copolymer. The charge transporting polymers may be used in an electrophotographic photoreceptor and an electrophotographic device.
    Type: Grant
    Filed: November 3, 1997
    Date of Patent: February 1, 2000
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yasuhiro Yamaguchi, Fumiaki Tambo, Taketoshi Hoshizaki, Yasuo Sakaguchi, Ryosaku Igarashi, Masakazu Iijima, Taketoshi Higashi
  • Patent number: 5834149
    Abstract: Hydroxygallium phthalocyanine crystals and an electrophotographic photoreceptor comprising the same. The hydroxygallium phthalocyanine crystals contain at least one of a polar organic solvent selected from the group consisting of a compound having an amido group, a compound having a sulfoxide group, and an organic amine.
    Type: Grant
    Filed: May 27, 1997
    Date of Patent: November 10, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Fumiaki Tambo, Katsumi Daimon, Yasuo Sakaguchi, Kazuo Yamasaki
  • Patent number: 5759726
    Abstract: An excellent electrographic photosensitive member having a high sensitivity, a high chargeability and a low residual potential. The electrographic photosensitive member comprises a photosensitive layer, or a photosensitive layer and an underlayer superimposed over an electroconductive support, wherein the photosensitive layer and/or the underlayer contain a chlorogallium phthalocyanine which is substituted with an electron-withdrawing group and has the following formula: ##STR1## where X represents an electron-withdrawing group such as a halogen atom and n is an integer of 2 to 4.
    Type: Grant
    Filed: January 15, 1997
    Date of Patent: June 2, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Fumiaki Tambo, Katsumi Daimon, Masakazu Iijima, Kazuo Yamasaki, Ryosaku Igarashi, Yasuhiro Yamaguchi
  • Patent number: 5756247
    Abstract: Hydroxygallium phthalocyanine crystals having intense diffraction peaks at Bragg angles (2.theta..+-.0.2.degree.) of 7.5.degree., 9.9.degree., 12.5.degree., 16.3.degree., 18.6.degree., 25.1.degree. and 28.3.degree. in Cuk.alpha. characteristic X-ray diffractometry, a process for producing the same, and an electrophotographic photoreceptor containing the same are disclosed. The hydroxygallium phthalocyanine crystals are obtained by once preparing impurity-free hydroxygallium phthalocyanine having intense X-ray diffraction peaks at specific Bragg angles, followed by a solvent treatment for crystal transformation, in which the impurity-free crystals are prepared by using excess phthalocyanine ring-forming compound in the synthesis of starting gallium phthalocyanine or by removing insoluble matter from the acid paste of starting gallium phthalocyanine.
    Type: Grant
    Filed: May 23, 1997
    Date of Patent: May 26, 1998
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Fumiaki Tambo, Katsumi Daimon, Yasuo Sakaguchi, Kazuo Yamasaki
  • Patent number: 5663327
    Abstract: Hydroxygallium phthalocyanine crystals having intense diffraction peaks at Bragg angles (2.theta..+-.0.2.degree.) of 7.5.degree., 9.9.degree., 12.5.degree., 16.3.degree., 18.6.degree., 25.1.degree. and 28.3.degree. in CuK.alpha. characteristic X-ray diffractometry, a process for producing the same, and an electrophotographic photoreceptor containing the same are disclosed. The hydroxygallium phthalocyanine crystals are obtained by once preparing impurity-free hydroxygallium phthalocyanine having intense X-ray diffraction peaks at specific Bragg angles, followed by a solvent treatment for crystal transformation, in which the impurity-free crystals are prepared by using excess phthalocyanine ring-forming compound in the synthesis of starting gallium phthalocyanine or by removing insoluble matter from the acid paste of starting gallium phthalocyanine.
    Type: Grant
    Filed: September 29, 1995
    Date of Patent: September 2, 1997
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Fumiaki Tambo, Katsumi Daimon, Yasuo Sakaguchi, Kazuo Yamasaki
  • Patent number: 5510823
    Abstract: A resistive element film-forming paste includes (1) an organic metal compound, (2) at least one organic non-metal additive, and (3) a solution of asphalt in a solvent. A resistive element is formed by coating the paste on a substrate followed by calcining.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: April 23, 1996
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hiroyuki Tanaka, Kaoru Torikoshi, Fumiaki Tambo, Katsuhiro Sato, Yutaka Akasaki
  • Patent number: 5384157
    Abstract: A process for producing a tungsten oxide film which comprises the steps of: reacting a tungstate with a salt of an organic compound represented by formula (I) to obtain a tungstic acid compound; mixing the tungstic acid compound with an organic solvent to prepare a composition; and removing an organic substance and the solvent from the composition:R.sub.1 R.sub.2 R.sub.3 NH.sup.+ X.sup.- (I)wherein R.sub.1, R.sub.2, and R.sub.3 each represents a hydrogen atom or a saturated or unsaturated hydrocarbon group having from 1 to 20 carbon atoms, and X.sup.- represents a halogen atom. A tungsten oxide film obtained by the above-described process and an electrochromic device comprising the tungsten oxide film.
    Type: Grant
    Filed: December 15, 1992
    Date of Patent: January 24, 1995
    Assignee: Fuji Xerox Co., Ltd.
    Inventor: Fumiaki Tambo
  • Patent number: 5384076
    Abstract: A resistive film-forming composition to be coated on a substrate and calcined to form a resistive film is disclosed, which contains an organic iridium compound selected from a compound represented by formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom, an alkyl group, or an alkoxy group, a compound represented by formula (II):Ir(R.sup.4 COCR.sup.3 COR.sup.5).sub.3wherein R.sup.3 represents a hydrogen atom or an alkyl group; and R.sup.4 and R.sup.5 each represent an alkyl group. A uniform resistive film having excellent electrical characteristics can be formed with good adhesion to a substrate.
    Type: Grant
    Filed: March 3, 1992
    Date of Patent: January 24, 1995
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Katsuhiro Sato, Kaoru Torikoshi, Hiroyuki Tanaka, Fumiaki Tambo, Yutaka Akasaki