Patents by Inventor Fumihiko KAJI

Fumihiko KAJI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus
    Patent number: 9343270
    Abstract: A plasma processing apparatus includes a processing chamber configured to partition a processing space and a microwave generator configured to generate microwaves for plasma excitation. Further, the plasma processing apparatus includes a dielectric member mounted in the processing chamber so as to seal the processing space, and configured to introduce the microwaves generated by the microwave generator into the processing space. Further, the plasma processing apparatus includes an injector mounted in the dielectric member, and configured to supply the processing gas made in a plasma state due to the microwaves to the processing space through a through-hole formed in the dielectric member. Further, the plasma processing apparatus includes a waveguide plate made of a dielectric material mounted in the injector so as to surround the through-hole of the dielectric member, and configured to guide the microwaves propagated into the dielectric member toward the through-hole to an inside of the injector.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: May 17, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Toshihisa Nozawa, Jun Yoshikawa, Michitaka Aita, Masahiro Yamazaki, Takehisa Saito, Fumihiko Kaji, Koji Yamagishi
  • PLASMA PROCESSING APPARATUS
    Publication number: 20140238607
    Abstract: A plasma processing apparatus includes a processing chamber configured to partition a processing space and a microwave generator configured to generate microwaves for plasma excitation. Further, the plasma processing apparatus includes a dielectric member mounted in the processing chamber so as to seal the processing space, and configured to introduce the microwaves generated by the microwave generator into the processing space. Further, the plasma processing apparatus includes an injector mounted in the dielectric member, and configured to supply the processing gas made in a plasma state due to the microwaves to the processing space through a through-hole formed in the dielectric member. Further, the plasma processing apparatus includes a waveguide plate made of a dielectric material mounted in the injector so as to surround the through-hole of the dielectric member, and configured to guide the microwaves propagated into the dielectric member toward the through-hole to an inside of the injector.
    Type: Application
    Filed: February 24, 2014
    Publication date: August 28, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Toshihisa NOZAWA, Jun YOSHIKAWA, Michitaka AITA, Masahiro YAMAZAKI, Takehisa SAITO, Fumihiko KAJI, Koji YAMAGISHI