Patents by Inventor Fumihiko Shinpuku

Fumihiko Shinpuku has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduction of reflection by amorphous carbon
    Patent number: 6007732
    Abstract: A pattern forming method having a step of forming an amorphous carbon film on a patterning layer formed on a substrate, a step of forming a photoresist film on the amorphous carbon film, a step of selectively exposing and developing the photoresist film to form a photoresist pattern, and a step of successively dry-etching the amorphous carbon film and the patterning layer by using the photoresist film as an etching mask. Desired optical constants of an amorphous carbon film formed by sputtering can be obtained by controlling a substrate temperature and other parameters.
    Type: Grant
    Filed: May 5, 1997
    Date of Patent: December 28, 1999
    Assignee: Fujitsu Limited
    Inventors: Koichi Hashimoto, Toshiyuki Ohtsuka, Fumihiko Shinpuku, Daisuke Matsunaga, Takayuki Enda
  • Reduction of reflection by amorphous carbon
    Patent number: 5656128
    Abstract: A pattern forming method having a step of forming an amorphous carbon film on a patterning layer formed on a substrate, a step of forming a photoresist film on the amorphous carbon film, a step of selectively exposing and developing the photoresist film to form a photoresist pattern, and a step of successively dry-etching the amorphous carbon film and the patterning layer by using the photoresist film as an etching mask. Desired optical constants of an amorphous carbon film formed by sputtering can be obtained by controlling a substrate temperature and other parameters.
    Type: Grant
    Filed: March 24, 1994
    Date of Patent: August 12, 1997
    Assignee: Fujitsu Limited
    Inventors: Koichi Hashimoto, Toshiyuki Ohtsuka, Fumihiko Shinpuku, Daisuke Matsunaga, Takayuki Enda