Patents by Inventor Fumikazu NOZAWA

Fumikazu NOZAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240052484
    Abstract: Supply system include a first vessel containing the precursor, a second vessel, a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a flow control device are fluidically mounted therein, a second gas conduit fluidically connecting the second vessel to a point of use, and a pressure gauge downstream the pressure reduction device for measuring a partial pressure of the precursor in the second vessel, wherein the partial pressure of the precursor in the second vessel is at a pressure lower than the saturated vapor pressure of the precursor at the temperature of the second vessel and higher than an inlet pressure requirement of the flow control device at the point of use. Methods for using the supply system are also disclosed.
    Type: Application
    Filed: October 2, 2020
    Publication date: February 15, 2024
    Inventors: Toshiyuki NAKAGAWA, Shingo OKUBO, Kazuma SUZUKI, Ikuo SUZUKI, Koji ISHIDA, Takashi KAMEOKA, Kazutaka YANAGITA, Mikio GOTO, Koji MATSUMOTO, Fumikazu NOZAWA, Terumasa KOURA, Kohei TARUTANI
  • Patent number: 10703631
    Abstract: A neon recovering/purifying system including: a recovery vessel that is arranged on an exhaust gas route and stores exhaust gas, the exhaust gas route being branched and extending from a discharge line; a compressor that increases a pressure of the exhaust gas sent out from the recovery vessel, to a third pressure; an exhaust gas flow rate regulating unit that regulates a flow rate of the exhaust gas whose pressure has been increased by the compressor; a first impurity removing unit that removes a first impurity from the exhaust gas; a second impurity removing unit that removes a second impurity from the exhaust gas from which the first impurity has been removed; a pressure increasing vessel that stores purified gas that has been processed by the first impurity removing unit and the second impurity removing unit; a pressure reducing valve that reduces a pressure of the purified gas sent out from the pressure increasing vessel, to the first pressure; and a purified gas flow rate regulating unit that regulates
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: July 7, 2020
    Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Sayaka Suzuki, Terumasa Koura, Fumikazu Nozawa
  • Publication number: 20190284684
    Abstract: Provided is a sublimated gas supply system capable of stabilizing the concentration of a sublimated gas of a solid material to be supplied and continuously supplying a sublimated gas with a stable concentration. The sublimated gas supply system includes a container; a heater for heating the container; a vacuum container configured so that a sublimated gas is introduced from the container in a vacuum state when a pressure measured with a container pressure gauge is the saturated vapor pressure of the sublimated gas; a flow amount control unit for controlling the flow amount of the dilution gas so that the concentration of the sublimated gas in the dilution gas inside the vacuum container is controlled to be a prescribed concentration based on the pressure inside the vacuum container when the sublimated gas is introduced into the vacuum container.
    Type: Application
    Filed: April 13, 2017
    Publication date: September 19, 2019
    Inventors: Chika SHIGAKI, Sayaka ISHIZUKA, Terumasa KOURA, Fumikazu NOZAWA
  • Publication number: 20180354795
    Abstract: A neon recovering/purifying system including: a recovery vessel that is arranged on an exhaust gas route and stores exhaust gas, the exhaust gas route being branched and extending from a discharge line; a compressor that increases a pressure of the exhaust gas sent out from the recovery vessel, to a third pressure; an exhaust gas flow rate regulating unit that regulates a flow rate of the exhaust gas whose pressure has been increased by the compressor; a first impurity removing unit that removes a first impurity from the exhaust gas; a second impurity removing unit that removes a second impurity from the exhaust gas from which the first impurity has been removed; a pressure increasing vessel that stores purified gas that has been processed by the first impurity removing unit and the second impurity removing unit; a pressure reducing valve that reduces a pressure of the purified gas sent out from the pressure increasing vessel, to the first pressure; and a purified gas flow rate regulating unit that regulates
    Type: Application
    Filed: September 13, 2016
    Publication date: December 13, 2018
    Inventors: Sayaka SUZUKI, Teramasa KOURA, Fumikazu NOZAWA
  • Publication number: 20180337510
    Abstract: It is an object to provide a removal function of removing impurities from exhaust gas including rare gas (for example, argon, xenon, krypton and the like) that is used in an excimer laser oscillation device, in a system of the excimer laser oscillation device. The excimer laser oscillation device including a gas recycle function includes an oscillation chamber in which laser gas having halogen gas, rare gas and buffer gas is filled inside, a first impurity removing device that removes impurities in exhaust gas that is discharged from the oscillation chamber, inside the system of the excimer laser oscillation device.
    Type: Application
    Filed: May 17, 2018
    Publication date: November 22, 2018
    Inventors: Terumasa KOURA, Koji MATSUMOTO, Fumikazu NOZAWA, Yusuke SHINOHARA