Patents by Inventor Fumiko Yonezawa

Fumiko Yonezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive composition, insulating film and organic EL display element
    Patent number: 6797450
    Abstract: According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity with a basic material and an electrode made from a metal having a low work function is suppressed, an insulating film for an organic EL element, which enables the formation of a through hole or U-shaped cavity therein and has excellent flattening performance, high transparency and high resistance to a resist stripper, and a radiation sensitive resin composition for forming the insulating film. An organic EL display element having this insulating film is free from an emission failure and has sufficiently long luminance half-life period and excellent reliability. The above composition comprises an alkali-soluble resin which may have an epoxy group and a 1,2-quinonediazide compound.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: September 28, 2004
    Assignee: JSR Corporation
    Inventors: Masayoshi Suzuki, Hirofumi Sasaki, Isao Nishimura, Fumiko Yonezawa, Masayuki Endo, Kazuaki Niwa
  • Radiation-sensitive composition, insulating film and organic el display element
    Publication number: 20030054284
    Abstract: According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity with a basic material and an electrode made from a metal having a low work function is suppressed, an insulating film for an organic EL element, which enables the formation of a through hole or U-shaped cavity therein and has excellent flattening performance, high transparency and high resistance to a resist stripper, and a radiation sensitive resin composition for forming the insulating film.
    Type: Application
    Filed: March 27, 2002
    Publication date: March 20, 2003
    Inventors: Masayoshi Suzuki, Hirofumi Sasaki, Isao Nishimura, Fumiko Yonezawa, Masayuki Endo, Kazuaki Niwa
  • Radiation sensitive resin composition and use of the same in an interlaminar insulating film
    Patent number: 6399267
    Abstract: A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an interlaminar insulating film. This radiation sensitive resin composition comprises: (A) a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy compound such as &bgr;-methylglycidyl acrylate and/or an epoxy compound such as a monomer represented by the following formula (3):  and (a3) an olefinic unsaturated compound other than the above (a1) and (a2); and (B) a 1,2-quinonediazide compound.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: June 4, 2002
    Assignee: JSR Corporation
    Inventors: Isao Nishimura, Masayoshi Suzuki, Fumiko Yonezawa, Masayuki Endo