Patents by Inventor Fusaoki Uchikawa
Fusaoki Uchikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7731162Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: GrantFiled: July 24, 2008Date of Patent: June 8, 2010Assignees: Shimadzu Corporation, Mitsubishi Denki Kabushiki KaishaInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Patent number: 7637482Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: GrantFiled: July 24, 2008Date of Patent: December 29, 2009Assignees: Shimadzu Corporation, Mitsubishi Denki Kabushiki KaishaInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Publication number: 20090045531Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: ApplicationFiled: July 24, 2008Publication date: February 19, 2009Applicants: SHIMADZU CORPORATION, MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Publication number: 20080295770Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: ApplicationFiled: July 24, 2008Publication date: December 4, 2008Applicants: SHIMADZU CORPORATION, MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Patent number: 7422198Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: GrantFiled: November 27, 2006Date of Patent: September 9, 2008Assignees: Shimadzu Corporation, Mitsubishi Denki Kabushiki KaishaInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Publication number: 20070085226Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: ApplicationFiled: November 27, 2006Publication date: April 19, 2007Applicants: SHIMADZU CORPORATION, MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Patent number: 7163197Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: GrantFiled: September 21, 2001Date of Patent: January 16, 2007Assignees: Shimadzu Corporation, Mitsubishi Denki Kabushiki KaihsaInventors: Naoki Yoshioka, Tatsushi Kawamoto, Mitsushi Kawao, Shigeru Matsuno, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Patent number: 6727021Abstract: A multilayer electrode battery which restrains temperature rise produced by an internal short circuit and has a compact size and a large battery capacity. The battery is a multilayer electrode battery which uses an electrode formed by providing positive temperature coefficient characteristics to at least one of an active material and an electronic conductive material in contact with the active material, and a collector of at least one of a positive electrode and a negative electrode, and which has a plurality of layers of multilayer electrode bodies.Type: GrantFiled: June 26, 2000Date of Patent: April 27, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Hisashi Shiota, Hiroaki Urushibata, Tetsuo Mitani, Fusaoki Uchikawa
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Patent number: 6586861Abstract: There is provided a film bulk acoustic wave device comprising: a silicon substrate 1, a dielectric film 21 including a silicon nitride 16 formed on the substrate 1 and a silicon oxide 2 on the silicon nitride 16, a bottom electrode 3 formed on the dielectric film 21, a piezoelectric film 17 formed on the bottom electrode 3, and a top electrode 5 formed on the piezoelectric film 17, wherein a via hole is formed in such a manner that the thickness direction of a part of the silicon substrate 1 which is opposite to a region including a part where the top electrode 5 exists is removed from the bottom surface of the silicon substrate 1 to a boundary surface with the silicon nitride 16.Type: GrantFiled: June 28, 2001Date of Patent: July 1, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Koichiro Misu, Kenji Yoshida, Koji Ibata, Shusou Wadaka, Tsutomu Nagatsuka, Fusaoki Uchikawa, Akira Yamada, Chisako Maeda
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Patent number: 6522809Abstract: A waveguide grating device controlling Bragg wavelength after manufacture of the device includes an optical waveguide on a substrate. A variable stress is applied to a waveguide grating in part of the waveguide to bend at least the portion of the substrate including the waveguide grating, changing the Bragg wavelength.Type: GrantFiled: August 17, 2000Date of Patent: February 18, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Masakazu Takabayashi, Kiichi Yoshiara, Sadayuki Matsumoto, Junichiro Hoshizaki, Takeyuki Maegawa, Hajime Takeya, Kiyohide Sakai, Minoru Hashimoto, Fusaoki Uchikawa
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Patent number: 6512297Abstract: A CVD source material which can be stably tramsported to a reactor in order to form a platinum metal, Cu, or an oxide of them as an electrode. An organometallic compound including a platinum metal (Ru, Pt, Ir, Pd, Os, Rh, Re) or Cu, is dissolved into tetrahydrofuran or a solvent containing tetrahydrofuran to obtain the CVD source material. In this material, the amount of moisture is preferably not more than 200 ppm. A film is formed by CVD employing this source material, the material is supplied stably, and the properties of the electrode film are improved. The capacitance property of the film is improved. Wiring of an electrical device may be formed by employing source material.Type: GrantFiled: March 26, 1999Date of Patent: January 28, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeru Matsuno, Fusaoki Uchikawa, Takehiko Sato, Akira Yamada
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Publication number: 20020058182Abstract: An electrode in which an active material 11 or 7, an electron conducting material 12 or a current collector 5 or 6 has PTC characteristics is used as at least one of positive and negative electrodes 1 and 2.Type: ApplicationFiled: December 31, 2001Publication date: May 16, 2002Applicant: MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Hisashi Shiota, Hiroaki Urushibata, Tetsuo Mitani, Fusaoki Uchikawa
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Patent number: 6383235Abstract: A process of preparation capable of easily preparing cathode materials having a homogeneous composition in a good mass productivity, a cathode material obtained by this process, and a secondary lithium ion battery using the cathode material. Aqueous solutions of each of a lithium salt, a transition metal salt, and a complexing agent are prepared and mixed in a stoichiometric ratio of a cathode material, and therefrom water is removed by spray-drying to give a precursor which is then sintered. High performance secondary lithium ion batteries are obtained by using the obtained cathode material in the positive electrode.Type: GrantFiled: August 20, 1998Date of Patent: May 7, 2002Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Takeyuki Maegawa, Ayumi Nozaki, Fusaoki Uchikawa
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Patent number: 6376889Abstract: A process for manufacturing a plurality of dielectric thin film devices by forming a lower layer on a substrate, coating a dielectric thin film on the lower layer, forming the dielectric thin film into a plurality of predetermined shapes, and, if desired, forming an upper structure on each of the plurality of dielectric thin films, wherein the dielectric thin film is divisionally formed on the lower layer by using a mask after the lower layer is formed to have a stress in a direction opposite to that of the dielectric thin film, or alternatively the dielectric thin film is divided into predetermined shapes after being formed.Type: GrantFiled: November 10, 1999Date of Patent: April 23, 2002Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Chisako Maeda, Akira Yamada, Toshio Umemura, Fusaoki Uchikawa
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Publication number: 20020043215Abstract: In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.Type: ApplicationFiled: September 21, 2001Publication date: April 18, 2002Inventors: Naoki Yoshioka, Tatsushi Kawamoto, Shigeru Matsuno, Mitsushi Kawao, Akira Yamada, Shoji Miyashita, Fusaoki Uchikawa
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Patent number: 6346345Abstract: An electrode in which an active material 11 or 7, an electron conducting material 12 or a current collector 5 or 6 has PTC characteristics is used as at least one of positive and negative electrodes 1 and 2.Type: GrantFiled: December 24, 1997Date of Patent: February 12, 2002Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Hisashi Shiota, Hiroaki Urushibata, Tetsuo Mitani, Fusaoki Uchikawa
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Publication number: 20010050391Abstract: There is provided a CVD raw material, which can be stably transported (supplied) to a reactor in order to form a platinum metal, Cu or an oxide thereof as an electrode.Type: ApplicationFiled: March 26, 1999Publication date: December 13, 2001Inventors: SHIGERU MATSUNO, FUSAOKI UCHIKAWA, TAKEHIKO SATO, AKIRA YAMADA
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Publication number: 20010050221Abstract: A method for manufacturing an infrared ray detector element utilizing a bolometer thin film having Bi1−xAxMn1O3 (element A being at least one element selected from a rare earth metal or an alkaline earth metal, 0≦x<1) as a main component. The method comprises a step of forming an oxide thin film having a metallic composition of Bi:A:Mn=1−x:X:1 by sputtering at a substrate temperature of equal to or above 100° C. and less than 500° C. within a gas atmosphere of containing oxygen or ozone. The second step is applying a heat treatment to the oxide thin film within a gas atmosphere containing oxygen or ozone to reduce the volume resistivity of the oxide thin film to a level at which an infrared ray detector circuit can operate. Thus, the bolometer having Bi1−xAxMn1O3 as a main component can be functioned as a bolometer and an infrared ray detector element of a high detectivity can be put in mass-production.Type: ApplicationFiled: January 22, 2001Publication date: December 13, 2001Inventors: Hiroko Higuma, Shoji Miyashita, Fusaoki Uchikawa
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Publication number: 20010045793Abstract: There is provided a film bulk acoustic wave device comprising: a silicon substrate 1, a dielectric film 21 including a silicon nitride 16 formed on the substrate 1 and a silicon oxide 2 on the silicon nitride 16, a bottom electrode 3 formed on the dielectric film 21, a piezoelectric film 17 formed on the bottom electrode 3, and a top electrode 5 formed on the piezoelectric film 17, wherein a via hole is formed in such a manner that the thickness direction of a part of the silicon substrate 1 which is opposite to a region including a part where the top electrode 5 exists is removed from the bottom surface of the silicon substrate 1 to a boundary surface with the silicon nitride 16.Type: ApplicationFiled: June 28, 2001Publication date: November 29, 2001Inventors: Koichiro Misu, Kenji Yoshida, Koji Ibata, Shusou Wadaka, Tsutomu Nagatsuka, Fusaoki Uchikawa, Akira Yamada, Chisako Maeda
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Publication number: 20010039923Abstract: A vaporizing device for CVD source materials comprising a vaporizer for vaporizing introduced CVD source materials through heating, a spray nozzle of which end portion is fixedly attached to the vaporizer for spraying the CVD source materials into the vaporizer, a cooling mechanism for cooling the spray nozzle, and a heat conduction restricting means attached either to the fixing portion, or to proximate of the fixing portion of the spray nozzle or the vaporizer. There can be achieved for an effect that generation of non-vaporized residues and particles can be decreased and that improvements in productivity owing to elongation of continuous operation time and decrease in film forming deficiencies can be achieved.Type: ApplicationFiled: July 6, 2001Publication date: November 15, 2001Inventors: Mikio Yamamuka, Tsuyoshi Horikawa, Takaaki Kawahara, Fusaoki Uchikawa, Shigeru Matsuno, Takehito Sato, Akira Yamada, Masayoshi Tarutani