Patents by Inventor Gabi Gruetzner

Gabi Gruetzner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof
    Patent number: 10126648
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: November 13, 2018
    Assignee: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PROTORESISTSYSTEME GMBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler
  • COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF
    Publication number: 20150079351
    Abstract: The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof.
    Type: Application
    Filed: May 24, 2013
    Publication date: March 19, 2015
    Applicant: MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
    Inventors: Hakki Hakan Atasoy, Gabi Grützner, Marko Vogler
  • Method of making and structuring a photoresist
    Publication number: 20050186500
    Abstract: A method of producing and structuring a UV 300/400 light sensitive highly viscous, chemically amplified positive photoresist which can be developed in an aqueous alkaline medium for application in layers of a thickness of 100 ?m or more and which can be removed without leaving any residue, for use in micro systems technologies.
    Type: Application
    Filed: September 21, 2004
    Publication date: August 25, 2005
    Inventors: Anja Voigt, Marina Heinrich, Gabi Gruetzner
  • Plastic male mold for fabricating microstructures and nanostructures using imprint lithography
    Publication number: 20040079730
    Abstract: Known electron beam lithography used for manufacturing male molds is cost-intensive and very time consuming. As a result, conventional highly sensitive electron beam resists have an insufficient plasma etching resistance and galvanic molding makes special demands on the structural profile and the thermal stability and solubility of the resist structures. The novel production and use of lithographically produced resist structures as male mold material for use in imprint lithography for producing microstructures and nanostructures should thus overcome the drawbacks associated with the conventional procedure for producing male molds. To this end, a negative resist system is used whose lithographically produced structures correspond to the demands made on a male mold for molding thin polymer layers. Lithographically produced structures comprised of curable materials are thus used for molding, preferably those based on photo-reactive epoxy resins.
    Type: Application
    Filed: June 5, 2003
    Publication date: April 29, 2004
    Inventors: Gisel Ahrens, Gabi Gruetzner, Karl Pfeiffer, Freimuth Reuther
  • Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively
    Patent number: 6398640
    Abstract: The invention relates top a light sensitive, aqueous alkali developing, negatively acting resist, comprising a phenolic resin as a binder, and a diazostilbene disulfonic acid ester light sensitive component, a solvent or mixture of solvents, and film forming and/or film stabilizing additives, and to a process for preparing the light sensitive component.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: June 4, 2002
    Assignee: Micro Resist Technology GmbH
    Inventors: Gabi Grützner, Anja Voigt, Jürgen Bendig, Ines Schmidt, Erika Sauer