Patents by Inventor Gabriel I. Font-Rodriguez

Gabriel I. Font-Rodriguez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
    Patent number: 6616985
    Abstract: An apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The distribution may be uniform, wafer-edge concentrated, or wafer-center concentrated. A contoured plate or profiler modifies the distribution. The profiler is an axially symmetric plate, having a narrow top end and a wider bottom end, shaped to redistribute the gas flow incident upon it. The method for tailoring the distribution of the active species over the substrate includes predetermining the profiler diameter and adjusting the profiler height over the substrate.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: September 9, 2003
    Assignee: Novellus Systems, Inc.
    Inventors: Ronald Allan Powell, Gabriel I. Font-Rodriguez, Simon Selitser, Emerson Derryck Settles
  • Apparatus for injecting and modifying gas concentration of a meta-stable species in a downstream plasma reactor
    Patent number: 6553933
    Abstract: This invention provides an apparatus for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The distribution may be made more or less uniform, wafer-edge concentrated, or wafer-center concentrated. A contoured plate or profiler is provided for modifying the distribution. The profiler is an axially symmetric plate, having a narrow top end and a wider bottom end, shaped to redistribute the gas flow incident upon it. The profiler is situated below an input port within the plasma reactor chamber and above the wafer. The method for tailoring the distribution of the active species over the substrate includes predetermining the profiler diameter and adjusting the profiler height over the substrate.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: April 29, 2003
    Assignee: Novellus Systems, Inc.
    Inventors: Ronald Allan Powell, Gabriel I. Font-Rodriguez, Simon Selitser, Emerson Derryck Settles
  • Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
    Publication number: 20020039625
    Abstract: This invention provides an apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The distribution may be made more or less uniform, wafer-edge concentrated, or wafer-center concentrated. A contoured plate or profiler is provided for modifying the distribution. The profiler is an axially symmetric plate, having a narrow top end and a wider bottom end, shaped to redistribute the gas flow incident upon it. The profiler is situated below an input port within the plasma reactor chamber and above the wafer. The method for tailoring the distribution of the active species over the substrate includes predetermining the profiler diameter and adjusting the profiler height over the substrate.
    Type: Application
    Filed: July 2, 2001
    Publication date: April 4, 2002
    Applicant: Novellus Systems, Inc.
    Inventors: Ronald A. Powell, Gabriel I. Font-Rodriguez, Simon Selitser, Emerson Derryck Settles
  • Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
    Publication number: 20020029747
    Abstract: This invention provides an apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The distribution may be made more or less uniform, wafer-edge concentrated, or wafer-center concentrated. A contoured plate or profiler is provided for modifying the distribution. The profiler is an axially symmetric plate, having a narrow top end and a wider bottom end, shaped to redistribute the gas flow incident upon it. The profiler is situated below an input port within the plasma reactor chamber and above the wafer. The method for tailoring the distribution of the active species over the substrate includes predetermining the profiler diameter and adjusting the profiler height over the substrate.
    Type: Application
    Filed: July 2, 2001
    Publication date: March 14, 2002
    Applicant: Novellus Systems, Inc.
    Inventors: Ronald A. Powell, Gabriel I. Font-Rodriguez, Simon Selitser, Emerson Derryck Settles
  • Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
    Patent number: 6287643
    Abstract: An apparatus and method for injecting gas within a plasma reactor and tailoring the distribution of an active species generated by the remote plasma source over the substrate or wafer. The distribution may be uniform, wafer-edge concentrated, or wafer-center concentrated. A contoured plate or profiler modifies the distribution. The profiler is an axially symmetric plate, having a narrow top end and a wider bottom end, shaped to redistribute the gas flow incident upon it. The method for tailoring the distribution of the active species over the substrate includes predetermining the profiler diameter and adjusting the profiler height over the substrate.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: September 11, 2001
    Assignee: Novellus Systems, Inc.
    Inventors: Ronald Allan Powell, Gabriel I. Font-Rodriguez, Simon Selitser, Emerson Derryck Settles