Abstract: In the object detection device, the plurality of object detection units output a score indicating a probability that a predetermined object exists, for each partial region set with respect to image data inputted. The weight computation unit computes a weight for each of the plurality of object detection units by using weight computation parameters and based on the image data. The weights are used when the scores outputted by the plurality of object detection units are merged. The weight redistribution unit changes the weight for a predetermined object detection unit, among the weights computed by the weight computation unit, to 0 and output the weights. The merging unit merges the scores outputted by the plurality of object detection units for each of the partial regions, by using the weights computed by the weight computation unit and including the weight changed by the weight redistribution unit.

Abstract: A control apparatus includes a first acquiring unit configured to acquire a hyperfocal length of a lens apparatus that is attachable to, detachable from, and communicable with an image pickup apparatus, using information acquired by communication between the lens apparatus and the image pickup apparatus, and a second acquiring unit configured to acquire a position of a focus lens in the lens apparatus according to the hyperfocal length.

Abstract: A control apparatus includes a first acquiring unit configured to acquire a hyperfocal length of a lens apparatus that is attachable to, detachable from, and communicable with an image pickup apparatus, using information acquired by communication between the lens apparatus and the image pickup apparatus, and a second acquiring unit configured to acquire a position of a focus lens in the lens apparatus according to the hyperfocal length.

Abstract: An image pickup apparatus attachable to and detachable from a lens apparatus includes an image sensor, an acquiring unit configured to acquire a hyperfocal length of the lens apparatus, and a setting unit configured to enable a user to change a diameter of a permissible circle of confusion for acquiring the hyperfocal length.

Abstract: A lithography apparatus which performs writing on a substrate using a charged particle beam is provided. The apparatus comprises a plurality of column units each of which comprises a charged particle optical system, a plurality of stages each of which is movable while holding the substrate, and a controller. The controller moves the stages in synchronization with each other in a positional relationship corresponding to an arrangement of the column units, and performs writing on substrates held in the stages simultaneously.

Abstract: A processed object processing apparatus which enables a plurality of processes to be carried out efficiently. A plurality of treatment systems are communicably connected together in a line and in which the objects to be processed are processed. A load lock system is communicably connected to the treatment systems and has a transfer mechanism that transfers the objects to be processed into and out of each of the treatment systems. At least one of the treatment systems is a vacuum treatment system, and the load lock system is disposed in a position such as to form a line with the treatment systems.

Abstract: A processed object processing apparatus which enables a plurality of processes to be carried out efficiently. A plurality of treatment systems are communicably connected together in a line and in which the objects to be processed are processed. A load lock system is communicably connected to the treatment systems and has a transfer mechanism that transfers the objects to be processed into and out of each of the treatment systems. At least one of the treatment systems is a vacuum treatment system, and the load lock system is disposed in a position such as to form a line with the treatment systems.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

Abstract: An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification ? in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification ? in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

Abstract: An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification ? in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification ? in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

Abstract: A processed object processing apparatus which enables a plurality of processes to be carried out efficiently. A plurality of treatment systems are communicably connected together in a line and in which the objects to be processed are processed. A load lock system is communicably connected to the treatment systems and has a transfer mechanism that transfers the objects to be processed into and out of each of the treatment systems. At least one of the treatment systems is a vacuum treatment system, and the load lock system is disposed in a position such as to form a line with the treatment systems.