Abstract: A light-field video stream may be processed to modify the camera pathway from which the light-field video stream is projected. A plurality of target pixels may be selected, in a plurality of key frames of the light-field video stream. The target pixels may be used to generate a camera pathway indicative of motion of the camera during generation of the light-field video stream. The camera pathway may be adjusted to generate an adjusted camera pathway. This may be done, for example, to carry out image stabilization. The light-field video stream may be projected to a viewpoint defined by the adjusted camera pathway to generate a projected video stream with the image stabilization.

Abstract: The present invention is related to a method for prediction of cortical spiking neural signal, comprising the following steps: 1) pretreatment of spiking neural signal, 2) modeling of posterior cortical spiking neural signal generation probability, 3) model accuracy measurement, 4) model optimization with the help of numerical gradient descent and 5) prediction of posterior cortical spiking neural signal with iterative calculation. The prediction method aims to incorporate natural features of point process of spiking neural signal into the target for optimization of prediction model to improve model's capability in predicting neural spike trains.

Abstract: A light-field video stream may be processed to modify the camera pathway from which the light-field video stream is projected. A plurality of target pixels may be selected, in a plurality of key frames of the light-field video stream. The target pixels may be used to generate a camera pathway indicative of motion of the camera during generation of the light-field video stream. The camera pathway may be adjusted to generate an adjusted camera pathway. This may be done, for example, to carry out image stabilization. The light-field video stream may be projected to a viewpoint defined by the adjusted camera pathway to generate a projected video stream with the image stabilization.

Abstract: A centrifugal blower includes an electric motor, a centrifugal impeller driven by the motor, a diffuser mounted to the motor and disposed between the motor and the centrifugal impeller, and a casing mounted to the diffuser. The centrifugal impeller is received in a chamber defined by the diffuser and the casing. the casing defines an opening facing the inlet of the centrifugal impeller. The diffuser has a plurality of passage walls, and a plurality of diffusing passages, each bounded by neighboring passage walls. The diffuser further has at least one mounting portion connected to one of the passage walls. A cross section of each of the diffusing passages is increased form an outer end to an inner end thereof and no throat is formed in each of the diffusing passages.

Abstract: Motion blur may be applied to a light-field image. The light-field image may be captured with a light-field camera having a main lens, an image sensor, and a plurality of microlenses positioned between the main lens and the image sensor. The light-field image may have a plurality of lenslet images, each of which corresponds to one microlens of the microlens array. The light-field image may be used to generate a mosaic of subaperture images, each of which has pixels from the same location on each of the lenslet images. Motion vectors may be computed to indicate motion occurring within at least a primary subaperture image of the mosaic. The motion vectors may be used to carry out shutter reconstruction of the mosaic to generate a mosaic of blurred subaperture images, which may then be used to generate a motion-blurred light-field image.

Abstract: Depths of one or more objects in a scene may be measured with enhanced accuracy through the use of a light-field camera and a depth sensor. The light-field camera may capture a light-field image of the scene. The depth sensor may capture depth sensor data of the scene. Light-field depth data may be extracted from the light-field image and used, in combination with the sensor depth data, to generate a depth map indicative of distance between the light-field camera and one or more objects in the scene. The depth sensor may be an active depth sensor that transmits electromagnetic energy toward the scene; the electromagnetic energy may be reflected off of the scene and detected by the active depth sensor. The active depth sensor may have a 360° field of view; accordingly, one or more mirrors may be used to direct the electromagnetic energy between the active depth sensor and the scene.

Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract: A manufacturing method of a semiconductor structure having an array area and a periphery area is provided. The manufacturing method includes the following steps. A substrate is provided. A plurality of trenches is formed on the substrate. The plurality of trenches is filled with insulating material to form at least one first insulating layer. A polysilicon layer is deposited on the substrate and the first insulating layer. A photoresist mask is formed on the periphery area. A portion of the polysilicon layer on the array area is etched, such that a top surface of the polysilicon layer on the array area is higher than the first insulating layer and lower than a top surface of the polysilicon layer on the periphery area. The photoresist mask is removed. A planarization process is implemented to remove a portion of the polysilicon layer on the array area and on the periphery area.

Abstract: A method for selecting samples of reticle design data patterns in order to calibrate the parameters based on which the reference image used in a die-to-database reticle inspection method is rendered, the method comprising the steps of applying local binary pattern (LBP) analysis to a plurality of samples to obtain a p-dimensional vector output for each of the plurality of samples, clustering the q-D data points to M groups, selecting one sample from each clustered group, calculating evaluation scores for the samples selected, and, selecting a portion of the M samples on the representativeness score and the diversity score.

Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract: A kit for retrofitting a golf cart having wheels driven by an electric motor. The kit includes a replacement motor controller for operating the electric motor. The replacement motor controller includes memory for storing motor operation limits corresponding to the golf cart. A driving parameter programmer is in communication with the replacement motor controller for selecting one or more driving parameters including: acceleration limit; speed limit; regenerative braking limit; and vehicle range. The replacement motor controller adjusts a motor control profile in real-time based on selection of the driving parameter, and the replacement motor controller maintains the motor control profile within the motor operation limits stored in the memory.

Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract: A manufacturing method of a semiconductor structure having an array area and a periphery area is provided. The manufacturing method includes the following steps. A substrate is provided. A plurality of trenches is formed on the substrate. The plurality of trenches is filled with insulating material to form at least one first insulating layer. A polysilicon layer is deposited on the substrate and the first insulating layer. A photoresist mask is formed on the periphery area. A portion of the polysilicon layer on the array area is etched, such that a top surface of the polysilicon layer on the array area is higher than the first insulating layer and lower than a top surface of the polysilicon layer on the periphery area. The photoresist mask is removed. A planarization process is implemented to remove a portion of the polysilicon layer on the array area and on the periphery area.

Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract: Apparatus and methods for inspecting a photolithographic reticle are disclosed. A reticle inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a reticle, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a reticle. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract: A method for selecting samples of reticle design data patterns in order to calibrate the parameters based on which the reference image used in a die-to-database reticle inspection method is rendered, the method comprising the steps of applying local binary pattern (LBP) analysis to a plurality of samples to obtain a p-dimensional vector output for each of the plurality of samples, clustering the q-D data points to M groups, selecting one sample from each clustered group, calculating evaluation scores for the samples selected, and, selecting a portion of the M samples on the representativeness score and the diversity score.

Abstract: A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate having a memory region and a periphery region; forming a memory cell on the memory region; forming a first polysilicon layer on the periphery region and the memory cell; forming a patterned cap layer on the periphery region; forming a second polysilicon layer on the first polysilicon layer and the patterned cap layer; and performing a chemical mechanical polishing (CMP) process to remove the second polysilicon layer, wherein the chemical mechanical polishing process comprises an abrasive of greater than 13% and a remove rate of less than 30 Angstroms/second.

Abstract: A centrifugal impeller includes a cover, a base opposite the cover and a plurality of blades. The cover has an inlet. The plurality of blades surround the inlet and are arranged between and connect the cover and the base. Inlet edges of one end of the blades adjacent the center of the impeller define a cavity in communicate with the inlet. The dimension of the cavity gradually decreases along the direction from the cover towards the base.

Abstract: A polishing method of a semiconductor device is disclosed. A substrate having a first side and a second side opposite to the first side is provided. The substrate has a device layer formed on the first side and a plurality of trench isolation structures therein extending from the first side to the second side. A main polishing step is performed to the second side of the substrate until a surface of at least one of the trench isolation structures is exposed. An auxiliary polishing step is then performed to the second side of the substrate. Besides, a silicon-to-oxide selectivity of the main polishing step is different from a silicon-to-oxide selectivity of the auxiliary step.

Abstract: Apparatus and methods for inspecting a photolithographic reticle are disclosed. A reticle inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a reticle, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a reticle. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.