Patents by Inventor Ganghui Teng

Ganghui Teng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7348131
    Abstract: A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a free radical initiator, and a sensitizing dye. Such dark aluminum substrate in combination with the hydrophilic treatment allows both clean background and good printing durability. Such plate can be exposed with a suitable laser at lower dosage to cause hardening in the exposed areas. The exposed plate can be developed with a regular liquid developer or with ink and/or fountain solution.
    Type: Grant
    Filed: July 5, 2005
    Date of Patent: March 25, 2008
    Inventor: Gary Ganghui Teng
  • Publication number: 20080038668
    Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 ?J/cm2, and then developed with an aqueous alkaline developer. Higher monomer to polymer weight ratio is advantageously used. A pigment is preferably incorporated into the photosensitive coating solution as a liquid dispersion. The exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH.
    Type: Application
    Filed: January 9, 2007
    Publication date: February 14, 2008
    Inventor: Gary Ganghui Teng
  • Publication number: 20070289468
    Abstract: A lithographic printing press having a plate cylinder in a light-tight compartment suitable for on-press imaging and developing a violet or ultraviolet laser sensitive plate is described. The plate cylinder as well as certain other press parts is covered by non-transparent or safe-light-only covers so that no or substantially no light or unsafe light passes onto the plate mounted on the plate cylinder during on-press imaging and development. The plate comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a violet or ultraviolet laser. The plate is on-press exposed with the laser, developed with ink and/or fountain solution, and then directly prints images to the receiving sheets.
    Type: Application
    Filed: June 14, 2006
    Publication date: December 20, 2007
    Inventor: Gary Ganghui Teng
  • Publication number: 20070172766
    Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a substrate a specific photosensitive composition is described. The photosensitive layer comprises a multifunctional (meth)acrylate monomer, a hexaarylbiimidazole compound, and a sensitizing dye. Combination of both multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 1000 ?J/cm2, and then developed either off press or on press.
    Type: Application
    Filed: December 13, 2006
    Publication date: July 26, 2007
    Inventor: Gary Ganghui Teng
  • Patent number: 7220486
    Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
    Type: Grant
    Filed: March 1, 2003
    Date of Patent: May 22, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Gary Ganghui Teng, Gary N. Taylor
  • Patent number: 7213516
    Abstract: A method of developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser and deactivated under a safe light or in the dark, and then on-press developed with ink and/or fountain solution preferably under white light. Alternatively, the plate is developed with ink and/or fountain solution or the likes off press, and then mounted on press for lithographic printing.
    Type: Grant
    Filed: November 4, 2005
    Date of Patent: May 8, 2007
    Inventor: Gary Ganghui Teng
  • Patent number: 7089856
    Abstract: Method of on-press developing a thermosensitive lithographic printing member with ink and/or fountain solution is described. The printing member comprises on a substrate a thermosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to an infrared radiation. The printing member can be a pre-coated plate or can be prepared on press by coating a thermosensitive layer onto a substrate that is a sheet material or a seamless sleeve mounted on a plate cylinder or is the surface of a plate cylinder of the lithographic press.
    Type: Grant
    Filed: February 10, 2003
    Date of Patent: August 15, 2006
    Inventor: Gary Ganghui Teng
  • Patent number: 6902866
    Abstract: Negative thermosensitive lithographic printing plates comprise on a hydrophilic substrate an oleophilic thermosensitive layer comprising a polymeric binder, urethane (meth)acrylate monomer having at least 6 (meth)acrylate groups, a non-urethane (meth)acrylate monomer having at least 4 (meth)acrylate groups, a free-radical initiator, and an infrared absorbing dye; wherein the weight ratio of said urethane (meth)acrylate monomer to said non-urethane (meth)acrylate monomer is from 0.10 to 3.0, and said thermosensitive layer is capable of hardening upon exposure to an infrared radiation. Lithographic plates with such compositions have excellent press durability.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: June 7, 2005
    Inventor: Gary Ganghui Teng
  • Patent number: 6902865
    Abstract: Negative thermosensitive lithographic printing plates developable with a non-alkaline aqueous developer and method of developing such plates. The plate comprises on a substrate a thermosensitive layer comprising an ethylenically unsaturated monomer, a free radical initiator, and an infrared absorbing dye. The plate can be imagewise exposed with an infrared laser to cause hardening in the exposed areas and then developed with a non-alkaline aqueous developer to remove the non-exposed areas. The non-alkaline aqueous developer can be water or an aqueous solution comprising at least 60% of water and having a pH of 2.0 to 10.0.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: June 7, 2005
    Inventor: Gary Ganghui Teng
  • Patent number: 6800422
    Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: October 5, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James Michael Mori, Gary Ganghui Teng
  • Patent number: 6767688
    Abstract: New photoresist compositions are provided that contain a halogenated salt, particularly a halogenated counter ion of an ammonium or alkyl ammonium salt. Preferred photoresists of the invention are chemically-amplified positive resists and contain an ammonium or alkyl ammonium salt that has a halogenated anion component such as a halogenated alkyl sulfonate or carboxylate anion component. Inclusion of the halogenated organic salt in a photoresist composition can provide enhanced lithographic performance.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: July 27, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Gary Ganghui Teng, James W. Thackeray, James F. Cameron
  • Patent number: 6745693
    Abstract: A variable data lithographic printing device comprises surrounding a printing cylinder a photosensitive layer coater, an exposure source, optionally a developer, an inking applicator, optionally a transfer system, and optionally an eraser. During printing operation, each surface areas of the rotating cylinder continuously undergo the cycle of coating, imagewise exposure, optionally developing, inking, printing of inked images to the receiving medium, and optionally erasing processes. The developing means can be omitted if an ink and/or fountain solution developable photosensitive layer is used. In an alternative design, the cylinder is replaced with a continuous supply of a ribbon with lithographic substrate surface. In another alternative design, the cylinder and the coater are replaced with a continuous supply of a pre-sensitized ribbon comprising on a substrate a photosensitive layer.
    Type: Grant
    Filed: May 19, 2003
    Date of Patent: June 8, 2004
    Inventor: Gary Ganghui Teng
  • Patent number: 6723493
    Abstract: Lithographic printing plates having on a hydrophilic substrate an oleophilic photosensitive layer comprising an oleophilic polymer, a free radical polymerizable monomer, and 4-piperonyl-2,6-bis(trichloromethyl)-s-triazine as free radical initiator and/or leucomalachite green as exposure indicating dye; wherein the weight ratio of the monomer to the polymer is larger than 1.0. The plates can be developed with ink and/or fountain solution on a lithographic printing press or with a non-alkaline aqueous developer comprising 60-99% by weight of water and 0.5 to 40% by weight of an alcohol solvent. A photosensitive dye can be added in the photosensitive layer to provide photosensitivity to a specific wavelength between 200 and 1200 nm. Unlike commonly used s-triazine initiator or leuco dye, 4-piperonyl-2,6-bis(trichloromethyl)-s-triazine or leucomalachite green does not insolubilize from the photosensitive layer.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: April 20, 2004
    Inventor: Gary Ganghui Teng
  • Publication number: 20040013968
    Abstract: Negative thermosensitive lithographic printing plates developable with a non-alkaline aqueous developer and method of developing such plates. The plate comprises on a substrate a thermosensitive layer comprising an ethylenically unsaturated monomer, a free radical initiator, and an infrared absorbing dye. The plate can be imagewise exposed with an infrared laser to cause hardening in the exposed areas and then developed with a non-alkaline aqueous developer to remove the non-exposed areas. The non-alkaline aqueous developer can be water or an aqueous solution comprising at least 60% of water and having a pH of 2.0 to 10.0.
    Type: Application
    Filed: July 22, 2002
    Publication date: January 22, 2004
    Inventor: Gary Ganghui Teng
  • Publication number: 20030228474
    Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Resists of the invention comprise a polymer component that contains one or more adhesion-promoting groups that can impart enhanced adhesion of a coating layer of a photoresist containing the polymer to an underlying substrate, including a SiON layer.
    Type: Application
    Filed: March 1, 2003
    Publication date: December 11, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Gary N. Taylor, Gary Ganghui Teng
  • Publication number: 20030226463
    Abstract: A variable data lithographic printing device comprises surrounding a printing cylinder a photosensitive layer coater, an exposure source, optionally a developer, an inking applicator, optionally a transfer system, and optionally an eraser. During printing operation, each surface areas of the rotating cylinder continuously undergo the cycle of coating, imagewise exposure, optionally developing, inking, printing of inked images to the receiving medium, and optionally erasing processes. The developing means can be omitted if an ink and/or fountain solution developable photosensitive layer is used. In an alternative design, the cylinder is replaced with a continuous supply of a ribbon with lithographic substrate surface. In another alternative design, the cylinder and the coater are replaced with a continuous supply of a pre-sensitized ribbon comprising on a substrate a photosensitive layer.
    Type: Application
    Filed: May 19, 2003
    Publication date: December 11, 2003
    Inventor: Gary Ganghui Teng
  • Publication number: 20030219603
    Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
    Type: Application
    Filed: March 1, 2003
    Publication date: November 27, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Gary Ganghui Teng, Gary N. Taylor
  • Publication number: 20030207200
    Abstract: The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
    Type: Application
    Filed: December 6, 2002
    Publication date: November 6, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Ashish Pandya, Wang Yueh, Anthony Zampini, Gary Ganghui Teng, Zhibiao Mao
  • Publication number: 20030180657
    Abstract: New photoresist compositions are provided that contain a halogenated salt, particularly a halogenated counter ion of an ammonium or alkyl ammonium salt. Preferred photoresists of the invention are chemically-amplified positive resists and contain an ammonium or alkyl ammonium salt that has a halogenated anion component such as a halogenated alkyl sulfonate or carboxylate anion component Inclusion of the halogenated organic salt in a photoresist composition can provide enhanced lithographic performance.
    Type: Application
    Filed: December 20, 2002
    Publication date: September 25, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Gary Ganghui Teng, James W. Thackeray, James F. Cameron
  • Publication number: 20030165777
    Abstract: Lithographic printing plates having on a hydrophilic substrate an oleophilic photosensitive layer comprising an oleophilic polymer, a free radical polymerizable monomer, and 4-piperonyl-2,6-bis(trichloromethyl)-s-triazine as free radical initiator and/or leucomalachite green as exposure indicating dye; wherein the weight ratio of the monomer to the polymer is larger than 1.0. The plates can be developed with ink and/or fountain solution on a lithographic printing press or with a non-alkaline aqueous developer comprising 60-99% by weight of water and 0.5 to 40% by weight of an alcohol solvent. A photosensitive dye can be added in the photosensitive layer to provide photosensitivity to a specific wavelength between 200 and 1200 nm. Unlike commonly used s-triazine initiator or leuco dye, 4-piperonyl-2,6-bis(trichloromethyl)-s-triazine or leucomalachite green does not insolubilize from the photosensitive layer.
    Type: Application
    Filed: March 24, 2003
    Publication date: September 4, 2003
    Inventor: Gary Ganghui Teng