Patents by Inventor Gaochao XU

Gaochao XU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240167000
    Abstract: A construction method and an application of an ovarian granulosa cell line of Oncorhynchus mykiss are provided. The construction method includes transferring a single follicle to a complete Minimum Essential Medium (MEM) containing collagenase H for digestion and transferring primary ovarian granulosa cells to 18° C. for constant temperature culture. The disclosure also provides an ovarian granulosa cell line constructed according to the construction method, and the application of the ovarian granulosa cell line in the separation and culture of fish granulosa cells, the molecular regulation mechanism of granulosa cells and the establishment of hormone metabolism cell models. The construction method of the disclosure has strong repeatability and simple operation steps, and after primary culture, the granulosa cells have good growth state and stable physiological state.
    Type: Application
    Filed: November 17, 2023
    Publication date: May 23, 2024
    Inventors: Tianqing HUANG, Enhui LIU, Gefeng XU, Wei GU, Gaochao WANG, Bingqian WANG, Kaibo GE
  • Publication number: 20240030351
    Abstract: A production method includes providing field-effect transistors; irradiating the field-effect transistors; applying a current to drains of the field-effect transistors for a duration; and applying a same voltage to gates and sources of the field-effect transistors. The voltage is a grounding voltage or a reverse voltage. The field-effect transistors can be in a reverse biased state in a case of cut-off, and electron-hole pairs can be generated at an insulating oxide layer and at an interface between the insulating oxide layer and a semiconductor substrate.
    Type: Application
    Filed: September 29, 2023
    Publication date: January 25, 2024
    Inventors: Yuhua Zhang, Xingfei Ke, Mingtao Zhou, Mengqi Yang, Gaochao Xu
  • Patent number: 9741837
    Abstract: A bidirectional IGBT device, including a cellular structure including: two MOS structures, a substrate drift layer, two highly doped buried layers operating for carrier storage or field stop, two metal electrodes, and isolating dielectrics. Each MOS structure includes: a body region, a heavily doped source region, a body contact region, and a gate structure. Each gate structure includes: a gate dielectric and a gate conductive material. The two MOS structures are symmetrically disposed on the top surface and the back surface of the substrate drift layer. The heavily doped source region and the body contact region are disposed in the body region and independent from each other, and both surfaces of the heavily doped source region and the body contact region are connected to each of the two metal electrodes. The gate dielectric separates the gate conductive material from a channel region of each of the MOS structures.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: August 22, 2017
    Assignees: UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA, INSTITUTE OF ELECTRONIC AND INFORMATION ENGINEERING IN DONGGUAN, UESTC
    Inventors: Jinping Zhang, Yadong Shan, Gaochao Xu, Xin Yao, Jingxiu Liu, Zehong Li, Min Ren, Bo Zhang
  • Publication number: 20160322483
    Abstract: A bidirectional IGBT device, including a cellular structure including: two MOS structures, a substrate drift layer, two highly doped buried layers operating for carrier storage or field stop, two metal electrodes, and isolating dielectrics. Each MOS structure includes: a body region, a heavily doped source region, a body contact region, and a gate structure. Each gate structure includes: a gate dielectric and a gate conductive material. The two MOS structures are symmetrically disposed on the top surface and the back surface of the substrate drift layer. The heavily doped source region and the body contact region are disposed in the body region and independent from each other, and both surfaces of the heavily doped source region and the body contact region are connected to each of the two metal electrodes. The gate dielectric separates the gate conductive material from a channel region of each of the MOS structures.
    Type: Application
    Filed: July 13, 2016
    Publication date: November 3, 2016
    Inventors: Jinping ZHANG, Yadong SHAN, Gaochao XU, Xin YAO, Jingxiu LIU, Zehong LI, Min REN, Bo ZHANG