Patents by Inventor Garret M MIYAKE
Garret M MIYAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230090784Abstract: The disclosure relates to benzo[ghi]perylene imide photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.Type: ApplicationFiled: January 11, 2021Publication date: March 23, 2023Inventors: Garret M. Miyake, Justin P. Cole, Ryan M. Pearson, Chern-Hooi Lim, Max Kudisch, Dian-Feng Chen
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Patent number: 10732321Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: GrantFiled: August 22, 2016Date of Patent: August 4, 2020Assignee: California Institute of TechnologyInventors: Garret M. Miyake, Raymond Weitekamp, Robert H. Grubbs, Victoria Piunova
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Patent number: 10081705Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.Type: GrantFiled: April 28, 2015Date of Patent: September 25, 2018Assignee: California Institute of TechnologyInventors: Yan Xia, Benjamin R. Sveinbjornsson, Robert H. Grubbs, Raymond Weitekamp, Garret M. Miyake, Victoria Piunova, Christopher Scot Daeffler
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Patent number: 9575212Abstract: Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.Type: GrantFiled: February 25, 2014Date of Patent: February 21, 2017Assignee: California Institute of TechnologyInventors: Robert H. Grubbs, Garret M. Miyake, Raymond Weitekamp, Victoria Piunova
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Publication number: 20160356923Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: ApplicationFiled: August 22, 2016Publication date: December 8, 2016Applicant: California Institute of TechnologyInventors: Garret M. MIYAKE, Raymond WEITEKAMP, Robert H. GRUBBS, Victoria PIUNOVA
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Patent number: 9453943Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: GrantFiled: June 28, 2013Date of Patent: September 27, 2016Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Garret M Miyake, Raymond Weitekamp, Robert H Grubbs, Victoria Piunova
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Patent number: 9382387Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.Type: GrantFiled: March 13, 2013Date of Patent: July 5, 2016Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Harry A Atwater, Victoria Piunova, Christopher Scot Daeffler, Sung Woo Hong, Weiyin Gu, Thomas P. Russell
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Publication number: 20160024244Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.Type: ApplicationFiled: April 28, 2015Publication date: January 28, 2016Inventors: Yan XIA, Benjamin R. SVEINBJORNSSON, Robert H. GRUBBS, Raymond WEITEKAMP, Garret M. MIYAKE, Victoria PIUNOVA, Christopher Scot DAEFFLER
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Patent number: 9156921Abstract: The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.Type: GrantFiled: July 15, 2014Date of Patent: October 13, 2015Assignee: California Institute of TechnologyInventor: Garret M. Miyake
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Patent number: 9045579Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.Type: GrantFiled: March 13, 2013Date of Patent: June 2, 2015Assignee: California Institute of TechnologyInventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Victoria Piunova, Christopher Scot Daeffler
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Publication number: 20150018446Abstract: The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.Type: ApplicationFiled: July 15, 2014Publication date: January 15, 2015Inventor: Garret M. Miyake
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Publication number: 20140243483Abstract: Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.Type: ApplicationFiled: February 25, 2014Publication date: August 28, 2014Applicant: California Institute of TechnologyInventors: Robert H. Grubbs, Garret M. Miyake, Raymond Weitekamp, Victoria Piunova
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Publication number: 20140011958Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.Type: ApplicationFiled: June 28, 2013Publication date: January 9, 2014Inventors: Garret M. MIYAKE, Raymond WEITEKAMP, Robert H. GRUBBS, Victoria PIUNOVA
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Publication number: 20130324666Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.Type: ApplicationFiled: March 13, 2013Publication date: December 5, 2013Inventors: Yan XIA, Benjamin R SVEINBJORNSSON, Robert H GRUBBS, Raymond WEITEKAMP, Garret M MIYAKE, Harry A ATWATER, Victoria PIUNOVA, Christopher Scot DAEFFLER