Patents by Inventor Garret M MIYAKE

Garret M MIYAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230090784
    Abstract: The disclosure relates to benzo[ghi]perylene imide photoredox catalysts (PC) and methods for the Birch reductions of aromatic substrates, such as benzene, benzeneoid, and heteroaromatic compounds, using light as the driving force. Certain aspects of the disclosure encompass methods for reduction of aromatic substrates. The method comprises contacting an aromatic substrate with a sacrificial electron donor in the presence of a photoredox catalyst in a solvent, thereby forming a reaction mixture; exposing the reaction mixture to visible or UV light under reaction condition sufficient to reduce the aromatic substrate compound.
    Type: Application
    Filed: January 11, 2021
    Publication date: March 23, 2023
    Inventors: Garret M. Miyake, Justin P. Cole, Ryan M. Pearson, Chern-Hooi Lim, Max Kudisch, Dian-Feng Chen
  • Patent number: 10732321
    Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: August 4, 2020
    Assignee: California Institute of Technology
    Inventors: Garret M. Miyake, Raymond Weitekamp, Robert H. Grubbs, Victoria Piunova
  • Patent number: 10081705
    Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: September 25, 2018
    Assignee: California Institute of Technology
    Inventors: Yan Xia, Benjamin R. Sveinbjornsson, Robert H. Grubbs, Raymond Weitekamp, Garret M. Miyake, Victoria Piunova, Christopher Scot Daeffler
  • Patent number: 9575212
    Abstract: Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: February 21, 2017
    Assignee: California Institute of Technology
    Inventors: Robert H. Grubbs, Garret M. Miyake, Raymond Weitekamp, Victoria Piunova
  • Publication number: 20160356923
    Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.
    Type: Application
    Filed: August 22, 2016
    Publication date: December 8, 2016
    Applicant: California Institute of Technology
    Inventors: Garret M. MIYAKE, Raymond WEITEKAMP, Robert H. GRUBBS, Victoria PIUNOVA
  • Patent number: 9453943
    Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: September 27, 2016
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Garret M Miyake, Raymond Weitekamp, Robert H Grubbs, Victoria Piunova
  • Patent number: 9382387
    Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: July 5, 2016
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Harry A Atwater, Victoria Piunova, Christopher Scot Daeffler, Sung Woo Hong, Weiyin Gu, Thomas P. Russell
  • Publication number: 20160024244
    Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.
    Type: Application
    Filed: April 28, 2015
    Publication date: January 28, 2016
    Inventors: Yan XIA, Benjamin R. SVEINBJORNSSON, Robert H. GRUBBS, Raymond WEITEKAMP, Garret M. MIYAKE, Victoria PIUNOVA, Christopher Scot DAEFFLER
  • Patent number: 9156921
    Abstract: The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: October 13, 2015
    Assignee: California Institute of Technology
    Inventor: Garret M. Miyake
  • Patent number: 9045579
    Abstract: The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: June 2, 2015
    Assignee: California Institute of Technology
    Inventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Victoria Piunova, Christopher Scot Daeffler
  • Publication number: 20150018446
    Abstract: The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.
    Type: Application
    Filed: July 15, 2014
    Publication date: January 15, 2015
    Inventor: Garret M. Miyake
  • Publication number: 20140243483
    Abstract: Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.
    Type: Application
    Filed: February 25, 2014
    Publication date: August 28, 2014
    Applicant: California Institute of Technology
    Inventors: Robert H. Grubbs, Garret M. Miyake, Raymond Weitekamp, Victoria Piunova
  • Publication number: 20140011958
    Abstract: The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.
    Type: Application
    Filed: June 28, 2013
    Publication date: January 9, 2014
    Inventors: Garret M. MIYAKE, Raymond WEITEKAMP, Robert H. GRUBBS, Victoria PIUNOVA
  • Publication number: 20130324666
    Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.
    Type: Application
    Filed: March 13, 2013
    Publication date: December 5, 2013
    Inventors: Yan XIA, Benjamin R SVEINBJORNSSON, Robert H GRUBBS, Raymond WEITEKAMP, Garret M MIYAKE, Harry A ATWATER, Victoria PIUNOVA, Christopher Scot DAEFFLER