Patents by Inventor Gary Allen Byers

Gary Allen Byers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
    Patent number: 10562151
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: February 18, 2020
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
    Publication number: 20180021921
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Application
    Filed: September 6, 2017
    Publication date: January 25, 2018
    Applicant: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
    Patent number: 9770804
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: September 26, 2017
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
    Publication number: 20140261824
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 18, 2014
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer