Patents by Inventor Gary D. Parks

Gary D. Parks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device and method for measuring reflective notch control in photoresists
    Patent number: 4860062
    Abstract: A simple, inexpensive device and method are disclosed for measuring the effectiveness of a photoresist composition in controlling reflective notching. The device utilized in practicing the method is a metalized silicon wafer having a U-shaped image thereon. This wafer may be coated with a photoresist, exposed through a grating pattern and developed, whereby the degree of notching of the photoresist lines may be readily observed.
    Type: Grant
    Filed: May 20, 1988
    Date of Patent: August 22, 1989
    Assignee: Shipley Company Inc.
    Inventor: Gary D. Parks