Patents by Inventor Gary N. Taylor
Gary N. Taylor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8012670Abstract: New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.Type: GrantFiled: April 11, 2003Date of Patent: September 6, 2011Assignee: Rohm and Haas Electronic Materials LLCInventors: Gary N. Taylor, Cheng-Bai Xu
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Patent number: 7220486Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.Type: GrantFiled: March 1, 2003Date of Patent: May 22, 2007Assignee: Shipley Company, L.L.C.Inventors: Gary Ganghui Teng, Gary N. Taylor
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Patent number: 7202009Abstract: This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.Type: GrantFiled: September 8, 2001Date of Patent: April 10, 2007Assignee: Shipley Company, L.L.C.Inventors: Peter Trefonas, III, Gary N. Taylor, Charles R. Szmanda
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Patent number: 7132214Abstract: This invention relates to resins and photoresist compositions that comprise such resins. This invention includes new resins that comprise photoacid-labile deblocking groups, wherein the acid-labile moiety is substituted with one or more electron-withdrawing groups. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm and sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications resins of the invention exhibit decreased absorbance of short wavelength exposure radiation, such as sub-170 nm radiation e.g. 157 nm.Type: GrantFiled: September 8, 2001Date of Patent: November 7, 2006Assignee: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Robert L. Brainard, Shintaro Yamada
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Patent number: 6858379Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.Type: GrantFiled: March 20, 2002Date of Patent: February 22, 2005Assignee: Shipley Company, L.L.C.Inventors: Anthony Zampini, Charles R. Szmanda, Gary N. Taylor, James F. Cameron, Gerhard Pohlers
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Patent number: 6852466Abstract: The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.Type: GrantFiled: December 23, 1998Date of Patent: February 8, 2005Assignee: Shipley Company, L.L.C.Inventors: Peter Trefonas, III, Gary N. Taylor
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Patent number: 6749986Abstract: The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.Type: GrantFiled: September 8, 2001Date of Patent: June 15, 2004Assignee: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Charles R. Szmanda
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Patent number: 6749983Abstract: The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.Type: GrantFiled: June 11, 1999Date of Patent: June 15, 2004Assignee: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Charles R. Szmanda
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Publication number: 20040029042Abstract: New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.Type: ApplicationFiled: April 11, 2003Publication date: February 12, 2004Inventors: Gary N. Taylor, Cheng-Bai Xu
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Publication number: 20030228474Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Resists of the invention comprise a polymer component that contains one or more adhesion-promoting groups that can impart enhanced adhesion of a coating layer of a photoresist containing the polymer to an underlying substrate, including a SiON layer.Type: ApplicationFiled: March 1, 2003Publication date: December 11, 2003Applicant: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Gary Ganghui Teng
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Publication number: 20030219603Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.Type: ApplicationFiled: March 1, 2003Publication date: November 27, 2003Applicant: Shipley Company, L.L.C.Inventors: Gary Ganghui Teng, Gary N. Taylor
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Publication number: 20030157428Abstract: The present invention provides novel photoresist compositions that comprise a resin binder, a photoacid generator compound and an added amine component. In a first aspect, the added amine preferably is 1) non-aromatic 2) has from about 9 to about 16 carbon atoms, 3) contains no primary or secondary amine groups, and/or 4) contains no multiple tertiary amine groups where two tertiary groups are separated by a linkage of optionally substituted ethylene. In a related aspect, the added amine is a non-aromatic amine that comprises either 1) a tertiary nitrogen alicyclic ring member, and preferably is at junction position between a bicyclic or other multi-ring ring system; or 2) a tertiary nitrogen that is not a ring member, and is substituted by at least two tertiary or quaternary carbon radicals.Type: ApplicationFiled: December 23, 1998Publication date: August 21, 2003Inventors: PETER TREFONAS, GARY N. TAYLOR
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Publication number: 20030082477Abstract: Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including ether linkages containing certain leaving groups. Also disclosed are methods of providing photoresist relief images using the photoresist compositions.Type: ApplicationFiled: March 19, 2002Publication date: May 1, 2003Applicant: Shipley Company, L.L.CInventors: Charles R. Szmanda, Gary N. Taylor
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Publication number: 20030027077Abstract: New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.Type: ApplicationFiled: March 20, 2002Publication date: February 6, 2003Applicant: Shipley Company, L.L.C.Inventors: Anthony Zampini, Charles R. Szmanda, Gary N. Taylor, James F. Cameron, Gerhard Pohlers
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Publication number: 20020058199Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm. Particular polymers and photoresists of the invention include at least one electronegative group that reduces 157 nm absorbance of a wide spectrum of organic groups including aromatic groups such as phenolic moieties.Type: ApplicationFiled: September 8, 2001Publication date: May 16, 2002Applicant: Shipley Company, L.L.C.Inventors: Anthony Zampini, Charles R. Szmanda, Sungseo Cho, Gary N. Taylor
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Publication number: 20020055060Abstract: The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.Type: ApplicationFiled: September 8, 2001Publication date: May 9, 2002Applicant: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Charles R. Szmanda
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Publication number: 20020055061Abstract: This invention relates to resins and photoresist compositions that comprise such resins. This invention includes new resins that comprise photoacid-labile deblocking groups, wherein the acid-labile moiety is substituted with one or more electron-withdrawing groups. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm and sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications resins of the invention exhibit decreased absorbance of short wavelength exposure radiation, such as sub-170 nm radiation e.g. 157 nm.Type: ApplicationFiled: September 8, 2001Publication date: May 9, 2002Applicant: Shipley Company, L.L.C.Inventors: Gary N. Taylor, Robert L. Brainard, Shintaro Yamada
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Publication number: 20020051938Abstract: This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.Type: ApplicationFiled: September 8, 2001Publication date: May 2, 2002Applicant: Shipley Company, L.L.C.Inventors: Peter Trefonas, Gary N. Taylor, Charles R. Szmanda
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Patent number: 6379861Abstract: The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C═O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.Type: GrantFiled: February 22, 2000Date of Patent: April 30, 2002Assignee: Shipley Company, L.L.C.Inventors: Peter Trefonas, III, Gary N. Taylor, George G. Barclay
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Patent number: 6165674Abstract: The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron features imaged at 193 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that includes a cyano moiety, as well as polymers that contain cyano and itaconic anhydride moieties in combination.Type: GrantFiled: January 15, 1998Date of Patent: December 26, 2000Assignee: Shipley Company, L.L.C.Inventors: Gary N. Taylor, George G. Barclay, Charles R. Szmanda