Patents by Inventor Gary R. Gardner

Gary R. Gardner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7378705
    Abstract: An Electrically Erasable Programmable Read Only Memory (EEPROM) memory cell and a method of operation are disclosed for creating an EEPROM memory cell in a standard CMOS process. A single polysilicon layer is used in combination with lightly doped MOS capacitors. The lightly doped capacitors employed in the EEPROM memory cell can be asymmetrical in design. Asymmetrical capacitors reduce area. Further capacitance variation caused by inversion can also be reduced by using multiple control capacitors. In addition, the use of multiple tunneling capacitors provides the benefit of customized tunneling paths.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: May 27, 2008
    Assignee: Honeywell International, Inc.
    Inventors: James E. Riekels, Thomas B. Lucking, Bradley J. Larsen, Gary R. Gardner
  • Patent number: 6952042
    Abstract: A microelectromechanical device and method of fabricating the same, including a layer of patterned and deposited metal or mechanical-quality, doped polysilicon inserted between the appropriate device element layers, which provides a conductive layer to prevent the microelectromechanical device's output from drifting. The conductive layer may encapsulate of the device's sensing or active elements, or may selectively cover only certain of the device's elements. Further, coupling the metal or mechanical-quality, doped polysilicon to the same voltage source as the device's substrate contact may place the conductive layer at the voltage of the substrate, which may function as a Faraday shield, attracting undesired, migrating ions from interfering with the output of the device.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: October 4, 2005
    Assignee: Honeywell International, Inc.
    Inventors: Thomas G. Stratton, Gary R. Gardner, Curtis H. Rahn
  • Publication number: 20030230147
    Abstract: A microelectromechanical device and method of fabricating the same, including a layer of patterned and deposited metal or mechanical-quality, doped polysilicon inserted between the appropriate device element layers, which provides a conductive layer to prevent the microelectromechanical device's output from drifting. The conductive layer may encapsulate of the device's sensing or active elements, or may selectively cover only certain of the device's elements. Further, coupling the metal or mechanical-quality, doped polysilicon to the same voltage source as the device's substrate contact may place the conductive layer at the voltage of the substrate, which may function as a Faraday shield, attracting undesired, migrating ions from interfering with the output of the device.
    Type: Application
    Filed: June 17, 2002
    Publication date: December 18, 2003
    Applicant: Honeywell International Inc.
    Inventors: Thomas G. Stratton, Gary R. Gardner, Curtis H. Rahn
  • Patent number: 5577996
    Abstract: A hand held massage device having a plurality of spheres adjustably mounted on an axial rod with enlarged grip handles mounted on the outer ends of the rod for rotation. The massage device is easy to use and, because the handles are in axial alignment with the massage spheres, allows the user to apply and direct the desired amount of pressure. The spheres of the massage device may be adjusted to various positions along the axis of the rod to comfort and to direct the massage to specific areas.
    Type: Grant
    Filed: March 15, 1995
    Date of Patent: November 26, 1996
    Inventors: Gary R. Gardner, James N. Kontaratos
  • Patent number: 5429981
    Abstract: A method for making a voltage linear capacitor for use with a metal oxide semiconductor field transistor wherein a capacitor portion of an SOI substrate is heavily doped with phosphorus. The thin oxide layer used for the transistor gate oxide also serves as the capacitor dielectric and the thickness of the dielectric relative to the gate oxide is controlled.
    Type: Grant
    Filed: June 30, 1994
    Date of Patent: July 4, 1995
    Assignee: Honeywell Inc.
    Inventors: Gary R. Gardner, Michael S. Liu