Patents by Inventor Gautam S. Grover

Gautam S. Grover has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compositions for oxide CMP
    Patent number: 6984588
    Abstract: A chemical mechanical polishing composition comprising a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film layer in a single step during the manufacture of integrated circuits and semiconductors.
    Type: Grant
    Filed: October 27, 2003
    Date of Patent: January 10, 2006
    Assignee: Cabot Microelectronics Corporation
    Inventors: Gautam S. Grover, Brian L. Mueller, Shumin Wang
  • Method of polishing or planarizing a substrate
    Patent number: 6872328
    Abstract: A method of polishing or planarizing a substrate comprising abrading at least a portion of the surface of a substrate comprising a metal, metal oxide, metal composite, or mixture thereof, with a composition comprising a metal oxide abrasive and a liquid carrier, wherein the composition has a pH of about 7 or less and the metal oxide abrasive has a total surface hydroxyl group density no greater than about 3 hydroxyl groups per nm2.
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: March 29, 2005
    Assignee: Cabot Microelectronics Corporation
    Inventors: James A. Dirksen, David W. Boldridge, Gautam S. Grover
  • Compositions for oxide CMP
    Publication number: 20040089634
    Abstract: A chemical mechanical polishing composition comprising a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film layer in a single step during the manufacture of integrated circuits and semiconductors.
    Type: Application
    Filed: October 27, 2003
    Publication date: May 13, 2004
    Applicant: Cabot Microelectronics Corporation
    Inventors: Gautam S. Grover, Brian L. Mueller, Shumin Wang
  • Composition for oxide CMP
    Patent number: 6689692
    Abstract: A chemical mechanical polishing composition comprising a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film layer in a single step during the manufacture of integrated circuits and semiconductors.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: February 10, 2004
    Assignee: Cabot Microelectronics Corporation
    Inventors: Gautam S. Grover, Brian L. Mueller, Shumin Wang
  • Composition for oxide CMP
    Patent number: 5759917
    Abstract: A chemical mechanical polishing composition comprising carboxylic acid, a salt and a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film layer in a single step during the manufacture of integrated circuits and semiconductors.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: June 2, 1998
    Assignee: Cabot Corporation
    Inventors: Gautam S. Grover, Brian L. Mueller