Abstract: A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and ?1 orders.

Abstract: An iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume is disclosed. These may then be used for photolithography on 3D surfaces, or for generation of holograms for use in consumer devices.

Abstract: A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a projection lens assembly (14). The SLM (8) is programmed or CGH configured with a modulation pattern that is determined by the substrate (12) topography and desired pattern. The substrate topography is provided by Digital Holography (DH) surface profilometery performed by a DH microscope (18), which provides geometrical or topographical input to the CGH calculation routines (16). An arrangement for vertical or sloping surface patterning has a grating (22) superimposed onto the CGH pattern (24) to generate +1 and ?1 orders.

Abstract: A method of generating a holographic diffraction pattern and a holographic lithography system. The method involves defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method and system enables holographic masks to be generated without creating a physical object to record. The required shapes or patterns are defined in terms of a three-dimensional coordinate space and a holographic pattern is generated at a defined distance from the shapes in the coordinate space.