Patents by Inventor Gemunu Dharmasena

Gemunu Dharmasena has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing system
    Publication number: 20050069651
    Abstract: A processing system having a processing chamber that includes a substrate holder and an electrode. The processing system can include a pressure control system, gas supply system, and monitoring system. A multi-frequency RF source is coupled to the electrode using a reduced-element matching network having a single variable element. The multi-frequency RF source is set to a first frequency to ignite a plasma and to a second frequency to maintain the plasma.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Applicants: TOKYO ELECTRON LIMITED, Advanced Engergy Industries, Inc.
    Inventors: Hideaki Miyoshi, Gemunu Dharmasena, Tsutomu Higashiura, Jack Gilmore, Joseph Osselburn, Theresa Beizer