Patents by Inventor Gen Fujii

Gen Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11464762
    Abstract: A carcinogenesis inhibitor having no side effect and having an excellent effect by oral administration. A carcinogenesis inhibitor containing a hydantoin derivative or a pharmaceutically acceptable salt thereof as an active ingredient shows an inhibiting action for polyp formation and for cell proliferation, and has no side effect and highly safe whereby it is very highly useful as a pharmaceutical agent and a food such as supplement which prevent the occurrence and progress of cancer, inhibits the recurrence and metastasis of cancer and further achieves the therapeutic effect.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: October 11, 2022
    Assignees: NATIONAL CANCER CENTER, NIPPON ZOKI PHARMACEUTICAL CO., LTD.
    Inventors: Michihiro Mutoh, Yurie Kurokawa, Gen Fujii, Shingo Miyamoto
  • Patent number: 10818703
    Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: October 27, 2020
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masafumi Morisue, Yasuhiro Jinbo, Gen Fujii, Hajime Kimura
  • Publication number: 20200276163
    Abstract: A carcinogenesis inhibitor having no side effect and having an excellent effect by oral administration. A carcinogenesis inhibitor containing a hydantoin derivative or a pharmaceutically acceptable salt thereof as an active ingredient shows an inhibiting action for polyp formation and for cell proliferation, and has no side effect and highly safe whereby it is very highly useful as a pharmaceutical agent and a food such as supplement which prevent the occurrence and progress of cancer, inhibits the recurrence and metastasis of cancer and further achieves the therapeutic effect.
    Type: Application
    Filed: June 12, 2018
    Publication date: September 3, 2020
    Applicants: NATIONAL CANCER CENTER, NIPPON ZOKI PHARMACEUTICAL CO., LTD.
    Inventors: Michihiro MUTOH, Yurie KUROKAWA, Gen FUJII, Shingo MIYAMOTO
  • Patent number: 10629813
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesives of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: April 21, 2020
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Publication number: 20190027688
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesives of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Application
    Filed: September 11, 2018
    Publication date: January 24, 2019
    Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
  • Patent number: 10153434
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: December 11, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Publication number: 20180053895
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Application
    Filed: October 13, 2017
    Publication date: February 22, 2018
    Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
  • Patent number: 9793482
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: October 17, 2017
    Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Patent number: 9620714
    Abstract: Oxidation treatment is performed to the surface of a substrate provided with a photocatalytic conductive film and an insulating film; treatment with a silane coupling agent is performed, so that a silane coupling agent film is formed and the surface of the substrate is modified to be liquid-repellent; and the surface of the substrate is irradiated with light of a wavelength (less than to equal to 390 nm) which has energy of greater than or equal to a band gap of a material for forming the photocatalytic conductive film, so that only the silane coupling agent film over the surface of the photocatalytic conductive film is decomposed and the surface of the photocatalytic conductive film can be modified to be lyophilic.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: April 11, 2017
    Assignee: Semiconductor Energy Laboratory Co., LTD.
    Inventors: Gen Fujii, Erika Takahashi
  • Publication number: 20170018713
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 19, 2017
    Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
  • Publication number: 20160329531
    Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.
    Type: Application
    Filed: July 20, 2016
    Publication date: November 10, 2016
    Inventors: Masafumi MORISUE, Yasuhiro JINBO, Gen FUJII, Hajime KIMURA
  • Patent number: 9461076
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Grant
    Filed: January 20, 2016
    Date of Patent: October 4, 2016
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Patent number: 9419142
    Abstract: A method for manufacturing a semiconductor device includes: forming a photocatalytic layer and an organic compound layer in contact with the photocatalytic layer over a substrate having a light transmitting property; forming an element forming layer over the substrate having the light transmitting property with the photocatalytic layer and the organic compound layer in contact with the photocatalytic layer interposed therebetween; and separating the element forming layer from the substrate having the light transmitting property after the photocatalytic layer is irradiated with light through the substrate having the light transmitting property.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: August 16, 2016
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masafumi Morisue, Yasuhiro Jinbo, Gen Fujii, Hajime Kimura
  • Publication number: 20160133654
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Application
    Filed: January 20, 2016
    Publication date: May 12, 2016
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Patent number: 9245922
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: January 26, 2016
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Osamu Nakamura, Gen Fujii, Fuminori Tateishi
  • Patent number: 8847482
    Abstract: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: September 30, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Gen Fujii, Erika Takahashi, Erumu Kikuchi, Sachiko Kawakami
  • Patent number: 8742421
    Abstract: An object of the present invention is to provide a display device which can be manufactured with usability of a material improved and with a manufacturing step simplified and to provide a manufacturing technique thereof. One feature of a display device of the present invention is to comprise an insulating layer having an opening, a first conductive layer formed in the opening, and a second conductive layer formed over the insulating layer and the first conductive layer, wherein the first conductive layer is wider and thicker than the second conductive layer, and the second conductive layer is formed by spraying a droplet including a conductive material.
    Type: Grant
    Filed: November 29, 2004
    Date of Patent: June 3, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Hideaki Kuwabara, Shinji Maekawa, Gen Fujii, Toshiyuki Isa
  • Patent number: 8624252
    Abstract: The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
    Type: Grant
    Filed: September 12, 2012
    Date of Patent: January 7, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shinji Maekawa, Gen Fujii, Hiroko Shiroguchi, Masafumi Morisue
  • Publication number: 20130341630
    Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
    Type: Application
    Filed: August 26, 2013
    Publication date: December 26, 2013
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Osamu NAKAMURA, Gen FUJII, Fuminori TATEISHI
  • Patent number: 8558227
    Abstract: The manufacturing method of the present invention includes steps of selectively forming a photocatalyst material or a material including an amino group by discharging a composition including the photocatalyst material or the material including an amino group; immersing the photocatalyst material or the material including an amino group in a solution including a plating catalyst material so as to adsorb or deposit the plating catalyst material onto the photocatalyst material or the material including an amino group; and immersing the plating catalyst material in a plating solution including a metal material so as to form a metal film on a surface of the photocatalyst material or the material including an amino group adsorbing or depositing the plating catalyst material, thereby manufacturing a semiconductor device. The pH of the solution including the plating catalyst material is adjusted in a range of 3 to 6.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: October 15, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Gen Fujii