Abstract: A method and apparatus is provided which continuously filters scrubbed gases prior to emission to the atmosphere. In particular, the method and apparatus can continuously scrub the effluent stream from a chemical vapor deposition process, such as the process used to deposit epitaxial silicon. In order to provide this continuous scrubbing, a separation housing having a filter housing is provided that permits the filter to be replaced during and without interruption of the scrubbing and filtering process. The filter housing can define a pair of tracks that guide the insertion and removal of a filter such that inserting a clean filter into one end of the pair of tracks causes a spent filter to be pushed out of the opposed end of the tracks as the clean filter is slid down the tracks.

Abstract: A chair is provided that is specifically designed for use in a clean room environment by limiting the emission of particles by the chair as clean room personnel alternately sit down and stand up. The chair includes a base and a seat member operably mounted upon the base. The seat member, in turn, includes a cushion and a shell encapsulating the cushion. The shell is comprised of polytetrafluoroethylene (PTFE). By encapsulating the cushion, such as a foam rubber cushion, in a PTFE shell, the chair limits emission of particles by the cushion.