Abstract: Glasses are disclosed which are used to produce substrates in flat panel display devices. The glasses exhibit a density less than about 2.45 gm/cm3 and a liquidus viscosity greater than about 200,000 poises, the glass consisting essentially of the following composition, expressed in terms of mol percent on an oxide basis: 65-75 SiO2, 7-13 Al2O3, 5-15 B2O3, 0-3 MgO, 5-15 CaO, 0-5 SrO, and essentially free of BaO. The glasses also exhibit a strain point exceeding 650° C.

Abstract: The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt % cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10?5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from silver halide-containing glass materials.

Abstract: A porous phosphorous glass composition, as calculated in weight percent on an oxide basis, including, for example: about 30-60 SiO2; about 2-25 P2O5; about 0-5 B2O3; about 20-50 Al2O3; about 0.01-20 Na2O; and about 0-20 K2O, the composition having porosity and pore size properties as defined herein. The disclosure also provides a method for making porous phosphorous glass compositions.

Abstract: Glasses are disclosed which are used to produce substrates in flat panel display devices. The glasses exhibit a density less than about 2.45 gm/cm3 and a liquidus viscosity greater than about 200,000 poises, the glass consisting essentially of the following composition, expressed in terms of mol percent on an oxide basis: 65-75 SiO2, 7-13 Al2O3, 5-15 B2O3, 0-3 MgO, 5-15 CaO, 0-5 SrO, and essentially free of BaO. The glasses also exhibit a strain point exceeding 650° C.

Abstract: Glasses are disclosed which are used to produce substrates in flat panel display devices. The glasses exhibit a density less than about 2.45 gm/cm3 and a liquidus viscosity greater than about 200,000 poises, the glass consisting essentially of the following composition, expressed in terms of mol percent on an oxide basis: 65–75 SiO2, 7–13 Al2O3, 5–15 B2O3, 0–3 MgO, 5–15 CaO, 0–5 SrO, and essentially free of BaO. The glasses also exhibit a strain point exceeding 650° C.

Abstract: The present invention provides an alkali alumino-silicate Na—F-containing glass material and a method of making the alkali alumino-silicate Na—F-containing glass material, with the glass material capable of being made photosensitive and thus formed into optical elements at wavelengths ranging between about 240 to 350 nm, and more particularly at the standard 248 nm wavelength of excimer lasers. Also disclosed is optical element wherein a refractive index pattern formed in the alumino-silicate Na—F containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10?5 at a wavelength of 633 nm.

Abstract: A lens array and a method for fabricating the lens array are described herein. The lens array is made from a photosensitive glass plate containing a relatively small amount of a photosensitive agent (e.g., silver, gold or combination thereof) such that when the photosensitive glass plate is subjected to an exposure step, a heat treatment step and an optional ion exchange step it becomes a glass composite plate that includes glass regions which are lenses and also includes an opaque opal region located around each of the lenses. The lens array has clear, colorless lenses exhibiting greater sag heights than those yellow lenses found in a traditional lens array made from the traditional photosensitive glass plate which was subjected to similar exposure, heat treatment and ion exchange steps.

Abstract: A birefringent glass composed of a phase-separated glass is provided. The phase-separated glass includes a borosilicate glass in which fluorine and a constituent that tends to crystallize into a high refractive index phase as a consequence of phase separation are included. In one embodiment, the constituent comprises TiO2.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: Glasses are disclosed which are used to produce substrates in flat panel display devices. The glasses exhibit a density less than about 2.45 gm/cm3 and a liquidus viscosity greater than about 200,000 poises, the glass consisting essentially of the following composition, expressed in terms of mol percent on an oxide basis: 65-75 SiO2, 7-13 Al2O3, 5-15 B2O3, 0-3 MgO, 5-15 CaO, 0-5 SrO, and essentially free of BaO. The glasses also exhibit a strain point exceeding 650° C.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate and germanosilicate bulk glasses to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al2O3, 10-36% of B2O3, 2-20% of GeO2, 40-80% of SiO2, 2-10% of R2O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

Abstract: The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt % cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10−5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from siliver halide-containing glass materials.

Abstract: A lens array and a method for fabricating the lens array are described herein. The lens array is made from a photosensitive glass plate containing a relatively small amount of a photosensitive agent (e.g., silver, gold or combination thereof) such that when the photosensitive glass plate is subjected to an exposure step, a heat treatment step and an optional ion exchange step it becomes a glass composite plate that includes glass regions which are lenses and also includes an opaque opal region located around each of the lenses. The lens array has clear, colorless lenses exhibiting greater sag heights than those yellow lenses found in a traditional lens array made from the traditional photosensitive glass plate which was subjected to similar exposure, heat treatment and ion exchange steps.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: The present invention is directed at a leaded copper boroaluminosilicate glass, having coefficients of thermal expansion (CTES) of between 25-55×10−7/°C. (over a range of 25-300° C.) and a softening point in the range of 550-725° C., being suitable for use as a sealing glass, especially for borosilicate glasses, and having a composition consisting essentially, in terms of weight percent on an oxide basis, of 27-60 SiO2, 3-14 Al2O3, 9-28 B2O3, 0.0-10 R2O, 0.1-40 PbO, 0.1-11 CuO, where R2O is an alkali oxide selected from the group consisting of Li2O, Na2O, K2O, Rb2O and Cs2O.

Abstract: Glasses are disclosed which are used to produce substrates in flat panel display devices. The glasses exhibit a density less than about 2.45 gm/cm3 and a liquidus viscosity greater than about 200,000 poises, the glass consisting essentially of the following composition, expressed in terms of mol percent on an oxide basis: 65-75 SiO2, 7-13 Al2O3, 5-15 B2O3, 0-3 MgO, 5-15 CaO, 0-5 SrO, and essentially free of BaO. The glasses also exhibit a strain point exceeding 650° C.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm.