Patents by Inventor George D. Papasoulitotis

George D. Papasoulitotis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gap fill for high aspect ratio structures
    Patent number: 6787483
    Abstract: Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: September 7, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Atiye Bayman, Md Sazzadur Rahman, Weijie Zhang, Bart van Schravendijk, Vishal Gauri, George D. Papasoulitotis, Vikram Singh
  • Gap fill for high aspect ratio structures
    Patent number: 6596654
    Abstract: Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.
    Type: Grant
    Filed: November 28, 2001
    Date of Patent: July 22, 2003
    Assignee: Novellus Systems, Inc.
    Inventors: Atiye Bayman, Md Sazzadur Rahman, Weijie Zhang, Bart van Schravendijk, Vishal Gauri, George D. Papasoulitotis, Vikram Singh