Patents by Inventor George Edward Bailey

George Edward Bailey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle
    Patent number: 7381502
    Abstract: A mask for use in a photolithographic process. The mask includes a plate or substrate having first and second opposite surfaces, a first image on the first surface of the substrate and a second image on the second surface of the substrate. When the mask is used in a photolithographic process, energy is reflected by the first image prior to entering the substrate and energy is reflected by the second image after passing through the substrate.
    Type: Grant
    Filed: September 16, 2004
    Date of Patent: June 3, 2008
    Assignee: LSI Logic Corporation
    Inventors: Michael Jay Berman, George Edward Bailey
  • Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle
    Patent number: 6866970
    Abstract: A mask for use in a photolithographic process. The mask includes a plate or substrate having first and second opposite surfaces, a first image on the first surface of the substrate and a second image on the second surface of the substrate. When the mask is used in a photolithographic process, energy is reflected by the first image prior to entering the substrate and energy is reflected by the second image after passing through the substrate.
    Type: Grant
    Filed: October 7, 2002
    Date of Patent: March 15, 2005
    Assignee: LSI Logic Corporation
    Inventors: Michael Jay Berman, George Edward Bailey