Patents by Inventor George J. Cernigliaro

George J. Cernigliaro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process and materials for formation of patterned films of functional materials
    Publication number: 20030073042
    Abstract: The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler is one that is essentially transparent to activating radiation. Once formed, the coating is exposed to activating radiation in an image pattern and developed to form the patterned layer of functional material. The organic components of the coating can be removed if desired.
    Type: Application
    Filed: October 17, 2001
    Publication date: April 17, 2003
    Inventors: George J. Cernigliaro, Roger F. Sinta
  • Dyed silica pigments and products made from same
    Patent number: 5885343
    Abstract: The adsorption of cationic dyes on nanosize negatively charged silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between the negative surface of the adsorbent silica particles preferably with sodium counter ions and the positive charge of the dyes. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: March 23, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: George J. Cernigliaro, Egon Matijevic, Daniel Y. Pai, Todd A. Richardson
  • Dye incorporated pigments and products made from same
    Patent number: 5871872
    Abstract: The adsorption of anionic dyes on nanosize alumina modified silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between positive surface of the absorbent and negative charge of the adsorbates. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: February 16, 1999
    Assignee: Shipley Company, LL.C.
    Inventors: Egon Matijevic, George J. Cernigliaro, Yie-Shein Her, Daniel Y. Pai, Todd A. Richardson
  • High temperature positive diazo photoresist processing using polyvinyl phenol
    Patent number: 4439516
    Abstract: This invention is for a photoresist capable of withstanding temperatures in excess of 200.degree. C. without image distortion. The photoresist comprises a high temperature diazo sensitizer, preferably an ester or amide of an o-quinone diazide sulfonic or carboxylic acid chloride, in a binder comprising a polyvinyl phenol. The sensitizer and polyvinyl phenol react with each other at elevated temperature. The sensitizer has a secondary decomposition temperature and the polyvinyl phenol has a flow temperature at least equal to the temperature where reaction between the two occurs.
    Type: Grant
    Filed: March 15, 1982
    Date of Patent: March 27, 1984
    Assignee: Shipley Company Inc.
    Inventors: George J. Cernigliaro, Charles R. Shipley