Patents by Inventor George ODLUM

George ODLUM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanofluidic device with silicon nitride membrane
    Patent number: 11819847
    Abstract: Embodiments of the present disclosure provide nanopore devices, such as nanopore sensors and/or other nanofluidic devices. In one or more embodiments, a nanopore device contains a substrate, an optional lower protective oxide layer disposed on the substrate, a membrane disposed on the lower protective oxide layer, and an optional upper protective oxide layer disposed on the membrane. The membrane has a pore and contains silicon nitride. The silicon nitride has a nitrogen to silicon ratio of about 0.98 to about 1.02 and the membrane has an intrinsic stress value of about ?1,000 MPa to about 1,000 MPa. The nanopore device also contains a channel extending through at least the substrate, the lower protective oxide layer, the membrane, the upper protective oxide layer, and the upper protective silicon nitride layer.
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: November 21, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ryan Scott Smith, Roger Quon, David Collins, George Odlum, Raghav Sreenivasan, Joseph R. Johnson
  • NANOFLUIDIC DEVICE WITH SILICON NITRIDE MEMBRANE
    Publication number: 20220016628
    Abstract: Embodiments of the present disclosure provide nanopore devices, such as nanopore sensors and/or other nanofluidic devices. In one or more embodiments, a nanopore device contains a substrate, an optional lower protective oxide layer disposed on the substrate, a membrane disposed on the lower protective oxide layer, and an optional upper protective oxide layer disposed on the membrane. The membrane has a pore and contains silicon nitride. The silicon nitride has a nitrogen to silicon ratio of about 0.98 to about 1.02 and the membrane has an intrinsic stress value of about ?1,000 MPa to about 1,000 MPa. The nanopore device also contains a channel extending through at least the substrate, the lower protective oxide layer, the membrane, the upper protective oxide layer, and the upper protective silicon nitride layer.
    Type: Application
    Filed: July 20, 2020
    Publication date: January 20, 2022
    Inventors: Ryan Scott SMITH, Roger QUON, David COLLINS, George ODLUM, Raghav SREENIVASAN, Joseph R. JOHNSON