Patents by Inventor Gerald John Alonzo

Gerald John Alonzo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
    Publication number: 20110318997
    Abstract: Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
    Type: Application
    Filed: June 20, 2011
    Publication date: December 29, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J. K. Olgado, Hung Chih Chen, Gerald John Alonzo
  • Apparatus and methods for conditioning a polishing pad
    Patent number: 7963826
    Abstract: Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: June 21, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J. K. Olgado, Hung Chih Chen, Gerald John Alonzo
  • APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
    Publication number: 20100093263
    Abstract: Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
    Type: Application
    Filed: December 11, 2009
    Publication date: April 15, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J. K. Olgado, Hung Chih Chen, Gerald John Alonzo
  • METHOD OF CALIBRATING OR COMPENSATING SENSOR FOR MEASURING PROPERTY OF A TARGET SURFACE
    Publication number: 20090042481
    Abstract: A method of calibrating or compensating a sensor for measuring property of target surface is provided. In one embodiment, a liquid reference surface is formed on a platen. A sensor is used to measure a feature property of the reference surface. The measured feature property of the reference surface may be used to calibrate the sensor. Further, the sensor is used to measure the feature property of a polishing pad. The measured feature property of the reference surface may be used to compensate the measured feature property of the polishing pad.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Inventors: Rashid A. Mavliev, Gerald John Alonzo, Simon Yavelberg
  • APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
    Publication number: 20090036035
    Abstract: Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
    Type: Application
    Filed: October 5, 2008
    Publication date: February 5, 2009
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J.K. Olgado, Hung Chih Chen, Gerald John Alonzo
  • APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
    Publication number: 20090036036
    Abstract: Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.
    Type: Application
    Filed: October 5, 2008
    Publication date: February 5, 2009
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J.K. Olgado, Hung Chih Chen, Gerald John Alonzo
  • APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
    Publication number: 20070212983
    Abstract: Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
    Type: Application
    Filed: March 12, 2007
    Publication date: September 13, 2007
    Inventors: Roy C. Nangoy, Shou-Sung Chang, Donald J.K. Olgado, Hung Chih Chen, Gerald John Alonzo