Abstract: The invention relates to a gas reservoir (3000) for receiving a precursor (3035). The gas reservoir (3000) has a gas-receiving unit (3004) which is arranged in a first receiving unit (3002) of a basic body (3001), and a sliding unit (3007) which is arranged movably in a second receiving unit (3003) of the basic body (3001). The gas-receiving unit (3004) has a movable closure unit (3006) for opening or closing a gas outlet opening (3005) of the gas-receiving unit (3004). In a first position of the sliding unit (3007), both a first opening (3009) of a sliding-unit line device (3008) is fluidically connected to a first basic body opening (3011) and a second opening (3010) of the sliding-unit line device (3008) is fluidically connected to a second basic body opening (3012). In the second position of the sliding unit (3007), both the first opening (3009) is arranged at an inner wall (3015) of the second receiving unit (3003) and the second opening (3010) is arranged at the movable closure unit (3006).

Abstract: A gas feed device includes a feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor, a first line device that conducts the gaseous state of the first precursor to the feed unit and a second line device that conducts the gaseous state of the second precursor to the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve is connected to the first valve and is arranged between the first valve and the feed unit. The control valve is connected to the second valve and is arranged between the second valve and the feed unit. The first valve, the second valve and/or the control valve may be magnetic valve(s).

Abstract: The system described herein relates to a gas feed device having a first precursor reservoir that receives a first precursor and having a second precursor reservoir that receives a second precursor, a feed unit that feeds a gaseous state of the first precursor and/or a gaseous state of the second precursor onto a surface of an object. A first line device is arranged between the first precursor reservoir and the feed unit. A second line device is arranged between the second precursor reservoir and the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve for the feed of the gaseous state of the first precursor and/or the gaseous state of the second precursor is connected to the first valve, the second valve and the feed unit.

Abstract: A method is provided of controlling a laser processing device with at least one laser. The method includes setting an optical path of the laser processing device by at least one rotatable mirror; a first triggering of the laser at a first point in time so as to generate a first laser spot; continuously adjusting, the optical path of the laser processing device; and a second triggering of the laser at a second point in time so as to generate a second laser spot. The method also includes, before the second triggering: determining the second point in time so that the position of the second laser spot has a desired distance, along the path, to the position of the first laser spot.

Abstract: An apparatus for contaminants being deposited thereon in a particle beam device, and also the particle beam device including the apparatus, are provided. This apparatus may be an anticontaminator. The apparatus according to the system described herein may include at least one cooling unit. The cooling unit may provide at least one cooled surface on which contaminants in a particle beam device are deposited. The apparatus according to the system described herein may further include at least one aperture unit. The aperture unit may be arranged at a motion device for moving the aperture unit relative to the cooling unit. Furthermore, the aperture unit may have at least one aperture opening. The cooling unit may be connected to the aperture unit by at least one first flexible thermal conductor.