Abstract: A method for stabilizing and lubricating elastomeric material includes depositing a first material film layer of carbide forming material by high energy level vacuum plating onto the elastomeric material to thereby stabilize free carbon atoms present in the elastomeric material. A second material film layer is deposited by high energy vacuum plating onto the first material film layer to thereby lubricate the elastomeric material.

Abstract: A method for lubricating a material-working tool comprises depositing a material film by high energy level vacuum plating onto the tool for providing a thin mechanically insulating film having a low shear stress value. The material film has a hardness which is less than the hardness of the tool which it overlies.

Abstract: The apparatus for making plastic containers having decreased gas permeability includes a chamber, an ionizing source located in the chamber for ionizing a material to be deposited on the containers, and a screen located between the ionizing source and the containers for preventing damage to the containers by heat generated by the ionizing source. The method includes the step of locating a screen between the ionization source and the container whereby heat generated by the ionization source will not damage the container.

Abstract: Apparatus for producing open ended plastic containers having decreased gas permeability that includes a vacuum chamber and a pump for regulating the pressure therein, an ionization source mounted in the chamber proximate the container's open end and a container holder located in the chamber. The container holder has a hole aligned with the open end and may include a shield that encompasses the exterior of the container and may include a magnet setting up a magnetic field on the exterior of the shield. In the method, a container is placed on the container holder in the chamber with the open end and hole aligned and with the shield and magnet located as described above. The coating material is vaporized and ionized so that the ionized material is deposited on the interior wall of the container.

Abstract: A method for resisting galling of two coacting threaded members (10, 16) is provided. The method includes depositing a material film (36) by high energy level ion plating onto the machined surfaces (12, 14) of at least one of the threaded members (10, 16) for providing a thin mechanically insulating film (36) on the threaded member (10, 16) having a low shear stress value.

Abstract: A method for ion plating a substrate (b 40) within a chamber (52) with a plating material (20) is provided. The method includes evacuating the chamber (52) and vaporizing the plating material (20) within the evacuated chamber (52). An electron saturated magnetic field (30) is placed adjacent the substrate (40) for positive ionization of the evaporant atoms of the vaporized plating material (20). A negative bias (61, 62) is applied to the substrate (40) for attracting positive ions of the vaporized plating material (20).

Abstract: There is disclosed a new and improved gasless ion plating apparatus and process which eliminates the prior need for electrically isolating the substrate from the evacuated chamber in which the plating process is performed. In accordance with a disclosed embodiment, one or more substrates to be plated are placed within the chamber. Also within the chamber there is disposed a plating source which includes plating material. The chamber is evacuated and the plating material is heated to vaporize the plating material. Radio frequency energy is applied to the plating source to form a plasma of positively charged plating ions from the vaporized plating material. A positive direct current bias is developed on the plating source relative to the substrates by, for example, applying a direct current positive voltage to the plating source to create an electrical field between the source and substrates for accelerating the plating ions towards the substrates for plating the same.

Abstract: A thin film treatment of rock formation drilling bits mounting a plurality of toothed rotatably mounted cones with cones having hard surface films deposited on the outer surface by a high particulate energy level ion plating process on the cone carrier material including the cone teeth. Bearing surfaces within the cones and, in most instances, the bearing surfaces of bearing journals of the bit arm journal and bearing roller and ball components as well are given a dry lubricant thin film plating deposited by a high particulate energy level ion plating process.

Abstract: A gasless ion plating process wherein plating material is melted, vaporized, and then subjected to an ionization environment in a low pressure chamber with a "virtual cathode" consisting of a plasma of ionized atoms of evaporant material created by evaporating in an RF field. It is a gasless ion plating process wherein the system ambient pressure prior to plating material evaporation may be much lower than that required to sustain a glow discharge, however, with vapor pressure of evaporant material added to the environment base pressure being such as to result in a plasma of ionized atoms of the plating material developing as the vaporized material approaches the RF cathode.This invention relates in general to high particulate energy level ion plating deposition of plating material, and in particular, to gasless ion plating.

Abstract: A high rate material vaporizing and ion generating source for controled environment high rate ion plating in providing high particulate energy level deposited film build ups. An externally shielded work coil surrounding the ion material source and fed by an alternating RF frequency power source inductively couples energy to an inductive magnetic field variation responsive material crucible. The crucible is advantageously positioned at the effective center of the coil within a tubular refractory heat shield, also positioned within the turns of the coil, that allows energy to enter the crucible, but heat shield retards radiant heat loss from the crucible region.

Abstract: A gasless ion plating process wherein plating material is melted, vaporized, and then subjected to an ionization environment in a low pressure chamber with a "virtual cathode" consisting of a plasma of ionized atoms of evaporant material created by evaporating in an RF field. It is a gasless ion plating process wherein the system ambient pressure prior to plating material evaporation may be much lower than that required to sustain a glow discharge, however, with vapor pressure of evaporant material added to the environment base pressure being such as to result in a plasma of ionized atoms of the plating material developing as the vaporized material approaches the RF cathode.